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ミニ・ガスクリーン・ピューリファイヤー

Pall's Mini Gaskleen gas purifier is a true point-of use purifier. A unique combination of Pall's cutting-edge AresKleen™ purification material and Ultramet-L® stainless steel filter media, it is designed to remove contamination from many process gases. The purifier is capable of sub ppb level purification at designed flow rates of up to 1 splm, while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • One-for-one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Purifies a wide variety of gases
  • 100% helium leak and pressure tested
  • Compact size
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692
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Datasheets

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概要

Pall's Mini Gaskleen gas purifier is a true point-of use purifier. A unique combination of Pall's cutting-edge AresKleen™ purification material and Ultramet-L® stainless steel filter media, it is designed to remove contamination from many process gases. The purifier is capable of sub ppb level purification at designed flow rates of up to 1 splm, while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • One-for-one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Purifies a wide variety of gases
  • 100% helium leak and pressure tested
  • Compact size
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692

仕様

Materials

  • Electropolished 316 L VAR PLUS stainless steel components
  • ≤ 0.25 μm / 10 μin Ra internal surface finish

Particle Removal Efficiency Rating

  • 1x109 retention of particles ≥ 3 nm up to 2 slpm

Connections

  • 1⁄4 in. Gasket seal, male / male (VCR1 compatible)

Operating Conditions

  • Maximum operating pressure: 20.7 MPa / 3,000 psig
  • Maximum operating temperature:
    • 100 °C / 212 °F (INP, SIP, FCP, SF6P)
    • 40 °C / 104 °F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
  • EU pressure equipment directive: Assemblies have been evaluated and designed using SEP per the European Union's Pressure Equipment Directive 2014/68/EU and are not CE marked

Design Flow Rate

  • 0-1 slpm @ 0.1 MPa / 15 psig
  • Higher intermittent flow rates of up to 2 slpm can be accommodated, with reduced lifetime2

Packaging

  • Double bagged
  • Outer bag: aluminized Mylar3
  • Inner bag: polyethylene
  • End fittings capped with metal seals
  • Product packaged in an argon environment

Dimensions

  • Length: 84 mm / 3.31 in.
  • Diameter: 21.3 mm / 0.84 in.
1 VCR is a trademark of Swagelok Company
2 Contact the Pall Microelectronics Group for further information.
3 Mylar is a registered trademark of Dupont Teijin Films.


Technical Information

Impurity Removal as Tested in Specific Gases
Specific Gas Impurity Removal Efficiency
Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, CO2, O2 and CO, as tested in argon and nitrogen using APIMS analyzer
Flammable gases: Silane, hydrogen, methane, ethane,
cyclopropane, propane, dimethyl ether		 < 1 ppb H2O, CO2, O2 and CO, as tested in argon, nitrogen and hydrogen using APIMS analyzer

< 1 ppb H2O, as tested in carbon monoxide using trace moisture analyzer

H2O and siloxanes removed to trace levels, as tested in silane using APIMS
Carbon monoxide < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5, as tested in carbon monoxide using GC-ECD analyzer
Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer

< 1 ppb O2, as tested in trifluoromethane using trace oxygen analyzer

< 10 ppb H2O, as tested in trifluoromethane using trace moisture analyzer and FTIR
Germane < 1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer
Sulfur hexafluoride < 1 ppb H2O, CO2, and O2, as tested in argon using APIMS
Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide, clean dry air < 10 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Hydrogen chloride < 15 ppb H2O as tested in hydrogen chloride using CRDS

< 1 ppb H2O as tested in argon using APIMS analyzer
Hydrogen bromide < 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air < 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS Analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction

性能

Pressure Drop vs. Gas Flow Rate

GLPINPVMM4

Lifetime Calculations

Pall AresKleen purification material: Inert gas service
Mini Gaskleen purifier assembly, part # GLPINPVMM4

Inlet pressure: 207 kPa (30 psig) contaminant challenge as H2O
contaminant challenge as H2O

Pall AresKleen purification material: Inert gas service
Mini-Gaskleen purifier assembly, part # GLPINPVMM4

Inlet pressure: 207 kPa (30 psig) contaminant challenge as O2
contaminant challenge as O2

参考情報

Nominal Dimensions

Dimensions

型式

Part Number Specific Gas Effluent Purity Specifications
GLPINPVMM4 Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, O2, CO2, CO
GLPSIPVMM4 Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether < 1 ppb H2O, CO2, O2, CO
  Carbon monoxide < 1 ppb H2O, O2, CO2, Ni(CO)4, Fe(CO)5
GLPFCPVMM4 Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2
GLPGEH4PVMM4 Germane < 1 ppb H2O, CO2, O2, CO
GLPSF6PVMM4 Sulfur hexafluoride < 1 ppb H2O, CO2, O2, CO
GLPOXPVMM4 Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide < 10 ppb H2O
GLPCLXPVMM4 Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O
GLPHCLPVMM4 Hydrogen chloride < 15 ppb H2O
GLPHBRPVMM4 Hydrogen bromide < 50 ppb H2O
GLPCDAPVMM4 Photolithography clean dry air < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO)

Unit conversion: 1 bar = 100 kilopascals

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