PhotoKleen™ NTD Filter Capsule product photo Primary L

PhotoKleen™ NTD Filter Capsule

Lithography Filter for Leading-edge Process

The PhotoKleen NTD filter capsule is designed for aggressive organic solvent applications, in advanced, high through-put track systems.

It is available in three filter configurations designed for point of use on advanced track systems (PhotoKleen EZD3X / PHF12, Photokleen EZD3XL / PHF13) and for chemical cabinet feed system (PhotoKleen EZD / PHF23)

The PhotoKleen NTD filter utilizes an all fluoropolymer construction for the ultimate compatibility and cleanliness. It also offers extremely low pressure drop.

Features

  • Easy change out style filter capsule
  • Minimized hold-up volume, and top in / top out flow direction, with inlet flow stream down to the bottom
  • Guaranteed metal, particle and organic cleanliness1

Benefits

Offers extremely low delta-P, enabling use in higher viscosity fluids

Reduces tool down time during filter start up and change out

Offers optimized membrane for target application

1 Contact Pall technical service for device claims


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Description

Lithography Filter for Leading-edge Process

The PhotoKleen NTD filter capsule is designed for aggressive organic solvent applications, in advanced, high through-put track systems.

It is available in three filter configurations designed for point of use on advanced track systems (PhotoKleen EZD3X / PHF12, Photokleen EZD3XL / PHF13) and for chemical cabinet feed system (PhotoKleen EZD / PHF23)

The PhotoKleen NTD filter utilizes an all fluoropolymer construction for the ultimate compatibility and cleanliness. It also offers extremely low pressure drop.

Features

  • Easy change out style filter capsule
  • Minimized hold-up volume, and top in / top out flow direction, with inlet flow stream down to the bottom
  • Guaranteed metal, particle and organic cleanliness1

Benefits

Offers extremely low delta-P, enabling use in higher viscosity fluids

Reduces tool down time during filter start up and change out

Offers optimized membrane for target application

1 Contact Pall technical service for device claims
Specifications

Materials of Construction

Components Materials2
Filter Medium Functionalized PTFE
Support and Drainage PFA
Core, Cage and End Caps PFA
Housing PFA
O-ring Kalrez1
1 Kalrez is a registered trademark of E. I. du Pont de Nemours and Company
2 All fluoropolymer materials made without PFOA
Removal Ratings 5 nm
Filter Areas PHF12 : 1,200 cm2
PHF13 : 2,400 cm2
PHF23 : 2,400 cm2
Maximum Operating Temperature PHF12, PHF13 : 30 °C / 86 °F
PHF23 : 23 °C / 73 °F
Maximum Operating Pressure PHF12, PHF13 : 0.29 MPaG @ 30 °C /42 psig @ 86 °F
PHF23 : 0.39 MPaG @ 23 °C /57 psig @ 73 °F


Typical Flow Characteristics - 1cP fluid, 20℃

Ordering Information
PHF12NTD2EH11B
PHF23NTD2EH11
PhotoKleen NTD PHF12NTD2EH11B
requires PhotoKleen EZD-3 head manifold
PhotoKleen NTD PHF23NTD2EH11
requires PhotoKleen EZD head manifold
PhotoKleen EZD3 head Manifold (PHF1 Type) PhotoKleen EZD head Manifold (PHYG type)

Dummy Capsules


Part Numbers / Ordering Information

PHFC1H11B (for PhotoKleenTM EZD-2, 3 manifolds)
PHFC2H11 (for PhotoKleenTM EZD manifolds)

Specifications

Materials of Construction
Components Materials
Housing PFA
O-ring Kalrez
Available head manifold PHFC1 : Fits into the PhotoKleenTM EZD2/3 manifolds
PHFC2 : Fits into the PhotoKleenTM EZD manifolds

Hold up volume PHFC1 : 1 mL
PHFC2 : 14 mL
Maximum Operating Temperature PHFC1 : 30 °C / 86 °F
PHFC2 : 23 °C / 73 °F
Maximum Operating Pressure PHFC1 : 0.29 MPa @ 30 °C / 42 psi @ 86 °F
PHFC2 : 0.39 MPa @ 23 °C / 57 psi @ 73 °F
Application
Lithography
Segment
Semiconductor