P-Nylon EX Filter product photo Primary L

P-Nylon EX Filter

The P-Nylon EX filter is specifically designed to target defects in the next generation lithography process. The Nylon Effect, which has proven to significantly reduce microbridge and cone defect in 193 nm resist and BARC chemicals, can now be applied to all lithography applications. The increased adsorption functionality and improved flow performance enhance the removal of hardly soluble polymer components. (almost 4 times increased gel capture capacity compared to the conventional Ultipleat® P-Nylon filter) This enhanced adsorption will contribute to further defect reduction.

Features and Benefits

  • Naturally hydrophilic (no surface modifications)
  • Low extractables
  • Enhanced adsorption capabilities
  • Reduces defects by optimizeding filter “Contact Time”
  • Wide range of available configurations Disposable filter capsule: PHD, DDF Filter cartridge: ABD


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Description

The P-Nylon EX filter is specifically designed to target defects in the next generation lithography process. The Nylon Effect, which has proven to significantly reduce microbridge and cone defect in 193 nm resist and BARC chemicals, can now be applied to all lithography applications. The increased adsorption functionality and improved flow performance enhance the removal of hardly soluble polymer components. (almost 4 times increased gel capture capacity compared to the conventional Ultipleat® P-Nylon filter) This enhanced adsorption will contribute to further defect reduction.

Features and Benefits

  • Naturally hydrophilic (no surface modifications)
  • Low extractables
  • Enhanced adsorption capabilities
  • Reduces defects by optimizeding filter “Contact Time”
  • Wide range of available configurations Disposable filter capsule: PHD, DDF Filter cartridge: ABD
Specifications

Materials

 
Components Materials
Medium Hydrophilic Asymmetric Nylon6,6
Support and Drainage High Density Polyethylene (HDPE)
Core, Cage, and End Caps High Density Polyethylene (HDPE)
Housing 1 High Density Polyethylene (HDPE)
O-ring options 2 PHD12 : Kalrez 3
ABD1 : FEP encapsulated fluoroelastomer
 

Specifications

 
Filter Areas PHD12 : 1,100 cm2
DDF1 : 1,600 cm2, DDF2 : 3,300 cm2, ABD1 : 9,400 cm2
Maximum Operating Temperature PHD12, DDF1, DDF2 : 30 °C / 86 °F
ABD1 : 50 °C / 120 °F
Maximum forward differential pressure PHD12, DDF1, DDF2 : 0.29 MPa @ 30 °C / 42 psi @ 86 °F ABD1 : 0.27 MPa @ 20 °C / 40 psi @ 68 °F
Maximum Operating Pressure 4 0.29 MPa @ 30 °C / 42 psi @ 86 °F
 
1 PHD12, DDF1 and DDF2 capsules
2 PHD12 capsules and ABD1 cartridges
3 Kalrez is a trademark of E. l. du Pont de Nemours and Company
4 PHD12, DDF1 and DDF2 capsules

Dimensions



Performance

Typical Flow Characteristics - 1cP fluid, 20℃




Type
Filter Cartridges
Ordering Information
 
Part Number Nominal Length
(mm / in)
Configuration O-Ring Material or Capsule Connections
PHD12ANXEH11B 73 / 2.9 Disposable Capsule Kalrez
DDF1ANXENP44 122 / 4.8 Disposable Capsule 1/4” Super Pillar 6 / 1/4” Super Pillar
DDF1ANXEFL44 148 / 5.8 Disposable Capsule 1/4” Flare style / 1/4” Flare style
DDF2ANXEFL64 212 / 8.3 Disposable Capsule 3/8” Flare style / 1/4” Flare style
ABD1ANX3EH1 254 / 10 Code 3 cartridge
222 double O-ring / flat end
FEP encapsulated fluoroelastomer
ABD1ANX8EH1 254 / 10 Code 8 cartridge
222 double O-ring / finned end
FEP encapsulated fluoroelastomer
ABD2ANX3EH1 508 / 20 Code 3 cartridge
222 double O-ring / flat end
FEP encapsulated fluoroelastomer
ABD2ANX8EH1 508 / 20 Code 8 cartridge
222 double O-ring / finned end
FEP encapsulated fluoroelastomer
 
6 Pillar is a trademark of Nippon Pillar Packing Co., Ltd
Application
Photolithography