Ultra Clean Water Filtration Skid product photo Primary L

Ultra Clean Water Filtration Skid

The new Ultra Clean Water Filtration Skid features the latest technology for ultrapure water cleanliness, using a newly developed ultrafiltration (UF) membrane that is dual-rated at 2 nm and 4 kD.

UF is the state of the art final filtration step prior to the final utilization of ultrapure water in semiconductor manufacturing. It is used to remove traces of

  • Nanoparticles
  • Macromolecules
  • Colloidal silicates

out of ultrapure water.

Hollow fiber membranes bundled in UF module housings divide the incoming ultrapure water into ultra clean permeate and contamination containing reject. Controlled back-diffusion of accumulated particles prevents contamination of the membrane. The reject—typically 5% of the permeate flow—discharges the collected contaminations from the UF modules. The reject flow will be cleaned up in a polisher.

The Ultra Clean Water Filtration Skid is used for today’s most demanding ultra-high purity water systems in sub fab level or at the point of use.

A Key Tool for UPW Supply in the Semiconductor Industry

Up to four UF modules are combined in a closed micro environment. They facilitate up to 50 m³/h permeate flow. Skids can be combined to provide higher flow capacity.

A purge flow of filtered clean dry air (CDA) prior to and during maintenance creates a clean environment surrounding the UF modules and reduces contamination of interfaces and piping /module connections.

Water reject is treated by a polishing unit that increases recovery rate up to 100%.

Designed to Meet the Highest Demands

  • Superior retention of nanoparticles, macro-molecular contamination and colloidal silicates
  • Up to 100 % recovery rate
  • Uses high performance Pall Microza UF modules
  • Preventive maintenance based on in situ module integrity tests using Palltronic® analyzers
  • Compact “all in one” cabinet provides smallest footprint
  • PVDF HP piping for highest purity
  • Air purging facilitates module exchange and maintenance operations under micro environment
  • Recording, visualization and digital monitoring of pressure signals by an electronic data manager enables easy system integration
  • “Plug & play” approach minimizes time and cost for installation and commissioning
  • Seismic brackets

*Microza is a trademark of Asahi Kasei Corporation



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Description

The new Ultra Clean Water Filtration Skid features the latest technology for ultrapure water cleanliness, using a newly developed ultrafiltration (UF) membrane that is dual-rated at 2 nm and 4 kD.

UF is the state of the art final filtration step prior to the final utilization of ultrapure water in semiconductor manufacturing. It is used to remove traces of

  • Nanoparticles
  • Macromolecules
  • Colloidal silicates

out of ultrapure water.

Hollow fiber membranes bundled in UF module housings divide the incoming ultrapure water into ultra clean permeate and contamination containing reject. Controlled back-diffusion of accumulated particles prevents contamination of the membrane. The reject—typically 5% of the permeate flow—discharges the collected contaminations from the UF modules. The reject flow will be cleaned up in a polisher.

The Ultra Clean Water Filtration Skid is used for today’s most demanding ultra-high purity water systems in sub fab level or at the point of use.

A Key Tool for UPW Supply in the Semiconductor Industry

Up to four UF modules are combined in a closed micro environment. They facilitate up to 50 m³/h permeate flow. Skids can be combined to provide higher flow capacity.

A purge flow of filtered clean dry air (CDA) prior to and during maintenance creates a clean environment surrounding the UF modules and reduces contamination of interfaces and piping /module connections.

Water reject is treated by a polishing unit that increases recovery rate up to 100%.

Designed to Meet the Highest Demands

  • Superior retention of nanoparticles, macro-molecular contamination and colloidal silicates
  • Up to 100 % recovery rate
  • Uses high performance Pall Microza UF modules
  • Preventive maintenance based on in situ module integrity tests using Palltronic® analyzers
  • Compact “all in one” cabinet provides smallest footprint
  • PVDF HP piping for highest purity
  • Air purging facilitates module exchange and maintenance operations under micro environment
  • Recording, visualization and digital monitoring of pressure signals by an electronic data manager enables easy system integration
  • “Plug & play” approach minimizes time and cost for installation and commissioning
  • Seismic brackets

*Microza is a trademark of Asahi Kasei Corporation

Specifications

Dimensions (Length x Width x Height)

Base Unit: 1,250 x 1,100 x 2,174 mm

Base Unit + Valves: 1,618 x 1,100 x 2,174 mm

Space Requirements
(Length x Width x Height, approximate)

Base Unit: 2,000 x 2,300 x 2,500 mm

Base Unit + Valves: 2,370 x 2,300 x 2,500 mm

Net Weight

380 kg (without disposable filters and UF Modules, approximate)

Main Connections

Feed and Permeate: DN100 or 4"

Reject: DN25 or 1"

Options

Master valves DN100 or 4" for feed and permeate. Further options on demand


Type

Systems

Additional Information

Design Parameters

 
Unit Value
Maximum operating pressure barg 9
Maximum operating temperature* °C up to 80
Design Permeate flow rate m3/h up to 50
Design airflow Nm3/h up to 58
Material for water piping system PVDF HP
Number of UF modules 1 to 4
Suitable UF module series Pall Microza OAT-6036 or OLT-6036
 
* 90 °C for short term sanitization

Utilities

  • Power supply for data logger:
    110-230 V AC, 1 phase 50 or 60 Hz.
  • Air supply:
    0.6 – 0.8 MPa ( 87 – 116 psig); < 60 Nm³/h (temporarily); dry, filtered, oil-free, ambient temperature
  • 24 V interface

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