PhotoKleen™ NTD Filter Cartridge product photo Primary L

PhotoKleen™ NTD Filter Cartridge

Lithography Filter for Leading-edge Process

The PhotoKleen™ NTD filter cartridge is designed for aggressive organics solvent application.

The PhotoKleen™ NTD filter is composed of all fluoropolymer materials that offer superior chemical compatibility with more aggressive lithography solvents such as: n-butyl acetate (nBA), cyclohexanone, dibutyl ether, toluene and gamma-butyrolactone.

The 5 nm rated PTFE media offers high particle retention while maintaining a low pressure drop.

Features

  • Available in 4”, 10” and 20” length
  • All fluoropolymer construction for the highest levels of cleanliness
  • Guaranteed metal, particle and organic cleanliness1

Benefits

  • Offers lower flow delta-P, to minimize ESD and bubble formation
  • Shipped dry for use in organic lithography solvents
1 Contact Pall technical service for device claims


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Description

Lithography Filter for Leading-edge Process

The PhotoKleen™ NTD filter cartridge is designed for aggressive organics solvent application.

The PhotoKleen™ NTD filter is composed of all fluoropolymer materials that offer superior chemical compatibility with more aggressive lithography solvents such as: n-butyl acetate (nBA), cyclohexanone, dibutyl ether, toluene and gamma-butyrolactone.

The 5 nm rated PTFE media offers high particle retention while maintaining a low pressure drop.

Features

  • Available in 4”, 10” and 20” length
  • All fluoropolymer construction for the highest levels of cleanliness
  • Guaranteed metal, particle and organic cleanliness1

Benefits

  • Offers lower flow delta-P, to minimize ESD and bubble formation
  • Shipped dry for use in organic lithography solvents
1 Contact Pall technical service for device claims

Specifications

Materials of Construction

 
Components Materials2
Filter Medium Functionalized PTFE
Support and Drainage PFA
Core, Cage and End Caps PFA
O-ring Perfrez3 PXC-Ultra
 
2All fluoropolymer materials made without PFOA
3 Perfrez is a trademark of Applied Seals North Americas
 
Removal Ratings 5 nm
Filter Areas ABF04 : 0.7 m2
ABF1 : 1.6 m2
ABF2 : 3.1 m2
Maximum Operating Temperature 110 °C / 230 °F
Maximum Forward Differential Pressure 0.59 MPa @ 50 °C / 86 psid @ 122 °F
0.41 MPa @ 110 °C / 59 psid @ 230 °F
 

Typical Flow Characteristics - 1cP fluid, 20℃

Type

Filter Capsules

Ordering Information

ABF [1] NTD23EH38

Table 1

Code Nominal Length (L)
04 4 inch
1 10 inch
2 20 inch

Nominal Dimensions

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