Order Products
Industries
Industrial Manufacturing
Filter Removal Rating
225 µm
Seal Material
Nitrile
HC8300EOT16H
6/EA
6
Ultipor® I Cleanable Filter Element
1/EA
1
Ultipor III Wire Mesh 225 micron Nitrile 8in 20.32cm
12/EA
12
High-Efficiency Depth Filters for CMP Application Filtration
Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.
Industries
Industrial Manufacturing
Filter Removal Rating
225 µm
Seal Material
Nitrile
Why choose CMP depth filter cartridges?
These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.
Removal Ratings
Pressure Drop vs. Liquid Flow Rate1
1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.