Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Nominal Length (Imperial)

5.2 in

PSS® Plus Series Junior Style Metal Elements, MCS4463PAHJ7BOX

Product ID: MCS4463PAHJ7BOX
Unit of Measure
1/EA
Min Order Qty
1
Filter Media
316 L Stainless Steel
Gasket Seal
Ethylene Propylene Steam Service
Maximum Differential Pressure
5.1 bard (73 psid) to 93.3 °C (200 °F)
Nominal Length (Imperial)
5.2 in
Recommended Maximum Flow Density
11 LPM/5.2
Removal Efficiency
99.9 %
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1 Item
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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