Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Biotech

Claris® Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 9.75 inches product photo

Claris® Filter Cartridges, Removal Rating 20 μm, Polypropylene, Length 9.75 inches

Product ID: CLR20975
Unit of Measure
36/EA
Min Order Qty
36
Length
24.8 cm / 9.75 in
Micron
20 micron
NXA 10-10U product photo

Nexis, NXA, 10 μm, 25.4 cm (10 in), DOE industrial (no end caps)

Product ID: NXA1010U
Unit of Measure
30/EA
Min Order Qty
30
Micron
10 micron
Nexis® A Series Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 30 inches, silicone, SOE fin end external 222 O-rings product photo

Nexis® A Series Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 30 inches, silicone, SOE fin end external 222 O-rings

Product ID: NXA130UM8S
Unit of Measure
12/EA
Min Order Qty
12
Micron
1 micron
Nexis® T Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 10 inches product photo

Nexis® T Filter Cartridges, Removal Rating 1 μm, Polypropylene, Length 10 inches

Product ID: NXT110UM7S
Unit of Measure
30/EA
Min Order Qty
30
Micron
1 micron
NXT 40-10U-M7S product photo

Nexis, NXT, 40 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), Silicone gasket

Product ID: NXT4010UM7S
Unit of Measure
1/EA
Min Order Qty
1
Micron
40 micron
5 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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