Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Filter Cartridges

Cartridge Length (Metric)

1003 mm

Filter Media

Polypropylene

Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 39.5 inches

Product ID: NXT10395UH21
Unit of Measure
10/EA
Min Order Qty
10
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
39.5 in
Cartridge Length (Metric)
1003 mm
Cartridge Length (Metric)
100.3 cm
Gasket / O-Ring Material
NA
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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