Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Microelectronics

Gasket / O-Ring Material

EPDM

NXA 0.5-10U-DOEE product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA0510UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-10U-M3E product photo

Nexis, NXA, 0.5 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0510UM3E
Unit of Measure
60/EA
Min Order Qty
60
Micron
0.5 micron
NXA 0.5-20U-DOEE product photo

Nexis, NXA, 0.5 μm, 50.8 cm (20 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA0520UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-20U-M3E product photo

Nexis, NXA, 0.5 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0520UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 0.5-30U-M3E product photo

Nexis, NXA, 0.5 μm, 76.2 cm (30 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA0530UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.5 micron
NXA 1-10U-M3E product photo

Nexis, NXA, 1 μm, 25.4 cm (10 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA110UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXA 120-10U-M7E product photo

Nexis, NXA, 120 μm, 25.4 cm (10 in), SOE fin end, external 226 O-rings (retrofits other manufacturers’ Code 7), EPDM gasket

Product ID: NXA12010UM7E
Unit of Measure
1/EA
Min Order Qty
1
Micron
120 micron
NXA 1-20U-M8E product photo

Nexis, NXA, 1 μm, 50.8 cm (20 in), SOE fin end, external 222 O-rings (retrofits other manufacturers’ Code 5), EPDM gasket

Product ID: NXA120UM8E
Unit of Measure
12/EA
Min Order Qty
12
Micron
1 micron
NXA 1-30U-DOEE product photo

Nexis, NXA, 1 μm, 76.2 cm (30 in), DOE with elastomer gasket seals and end caps, EPDM gasket

Product ID: NXA130UDOEE
Unit of Measure
1/EA
Min Order Qty
1
Micron
1 micron
NXA 20-20U-M3E product photo

Nexis, NXA, 20 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA2020UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
20 micron
NXA 20-4U-M3E product photo

Nexis, NXA, 20 μm, 10.2 cm (4 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA204UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
20 micron
NXA 2-20U-M3E product photo

Nexis, NXA, 2 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA220UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
2 micron
32 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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