Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

Order Products

Product Type

Large Format Filters

Nexis® High Flow Large Format Filters, Removal Rating 40 µm, Length 40 inches, Ethylene propylene O-ring

Product ID: HFNX640Y400J
Unit of Measure
4/EA
Min Order Qty
4
Cartridge Length
40/1016 inch/mm
Filter Grade
40 µm
Outside Diameter (Imperial)
6 in
Outside Diameter (Metric)
152.4 mm
Cartridge Length (Imperial)
40 in
Cartridge Length (Metric)
1016 mm
See All Attributes

Ultipleat® High Flow, Large Format Filters, Filter Grade 6 µm, Resinbondedglassfiber, Length 9 Inches

Product ID: HFU609GF060H13
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 29 µm, Resinbondedglassfiber, Length 9 Inches

Product ID: HFU609GF400H
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 20 µm, Resinbondedglassfiber, Length 9 Inches

Product ID: HFU609GF200H
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 10 µm, Resinbondedglassfiber, Length 9 Inches, Fluoroelastomer O-ring Material

Product ID: HFU609GF100H
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 10 µm, Pleated Polypropylene Depth Structure, Length 9 Inches, Fluoroelastomer O-ring Material

Product ID: HFU609UY100H
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 6 µm, Glass Fiber Media with Aramid Support, Length 9 Inches

Product ID: HFU609UY060J
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 10 µm, Pleated Polypropylene Depth Structure, Length 9 Inches

Product ID: HFU609UY100J
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 4.5 µm, Pleated Polypropylene Depth Structure, Length 9 Inches, Fluoroelastomer O-ring Material

Product ID: HFU609UY045H
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 1 µm, PleatedPolypropylenePES, Length 20 Inches, Ethylene Propylene U-Cup

Product ID: HFU620CAS010JU
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Length 20 Inches

Product ID: HFU620G400ZH
Unit of Measure
4/EA
Min Order Qty
4

Ultipleat® High Flow, Large Format Filters, Filter Grade 1 µm, PleatedPolypropylenePES, Length 20 Inches, Polypropylene Support

Product ID: HFU620CAS010HU
Unit of Measure
4/EA
Min Order Qty
4
780 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

    Select Language :
    English