Profile® Nano Depth Filter Cartridge

For CMP Applications in Microelectronics

Profile Nano advanced depth filter cartridges are high-performance slurry filters that classify ceria and low solids colloidal silica slurries. They are used in chemical mechanical planarization (CMP) processes such as shallow trench isolation (STI) and barrier copper.

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Product Use

Pre-Filtration

Claris® Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 30 inches product photo

Claris® Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 30 inches

Product ID: CLR330
Unit of Measure
12/EA
Min Order Qty
12
Micron
3 micron
Length
76.2 cm / 30 in
Claris, Polypropylene, 5 micron, 29.5 inch product photo

Claris, Polypropylene, 5 micron, 29.5 inch

Product ID: CLR5295
Unit of Measure
12/EA
Min Order Qty
12
Micron
5 micron
Length
74.9 cm / 29.5 in
Claris® Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 39 inches product photo

Claris® Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 39 inches

Product ID: CLR3039
Unit of Measure
12/EA
Min Order Qty
12
Micron
30 micron
Length
102 cm / 40 in
Claris, Polypropylene, 50 micron, 29.25 inch product photo

Claris, Polypropylene, 50 micron, 29.25 inch

Product ID: CLR502925
Unit of Measure
12/EA
Min Order Qty
12
Micron
50 micron
Length
74.3 cm / 29.25 in
CLR 5-30-DOEE product photo

CLR 5-30-DOEE

Product ID: CLR530DOEE
Unit of Measure
12/EA
Min Order Qty
12
Nexis® A Series Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 inches, EPDM, SOE flat closed end external 222 O-rings product photo

Nexis® A Series Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 30 inches, EPDM, SOE flat closed end external 222 O-rings

Product ID: NXA1030UM3E
Unit of Measure
1/EA
Min Order Qty
12
Micron
10 micron
NXA 2-20U-M3E product photo

Nexis, NXA, 2 μm, 50.8 cm (20 in), SOE flat closed end, external 222 O-rings (retrofits other manufacturers’ Code 0), EPDM gasket

Product ID: NXA220UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
2 micron
Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 40 inches, EPDM, SOE flat closed end external 222 O-rings product photo

Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 40 inches, EPDM, SOE flat closed end external 222 O-rings

Product ID: NXT1040UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
10 micron
Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 10 inches product photo

Nexis® T Filter Cartridges, Removal Rating 3 μm, Polypropylene, Length 10 inches

Product ID: NXT310U
Unit of Measure
1/pkg
Min Order Qty
1
Micron
3 micron
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, Nitrile (standard gaskets) product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, Nitrile (standard gaskets)

Product ID: PFT0210UN44
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 20 Inches, Nitrile, DOE industrial

Product ID: PFT0220UNB
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 30 Inches, silicone, DOE industrial product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 30 Inches, silicone, DOE industrial

Product ID: PFT0230US
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
894 Items

Description

Why choose Profile Nano depth filter cartridges for CMP applications?

 

These CMP filters efficiently remove particles as fine as 100 nm with the help of extremely fine fibers manufactured via a highly advanced melt-blowing process.

 

Additional benefits include:

 

  • High removal efficiency for particles predominantly captured by sieving and other mechanical filtration mechanisms
  • Each zone is manufactured to a given specification, ensuring consistent and reproducible performance
  • Steep efficiency curves result in minimal strip-out of desirable slurry particles while sharply increasing removal of oversized particles

Product Highlights: 

  • Higher performance
  • For fine particle removal
  • Includes multi-zone pore construction
  • Longer service life

Applications/Use

Microelectronics:

  • Semiconductor – CMP

Specifications

*Please refer to the documentation for additional specifications.

 

Materials
  • Medium: Polypropylene
  • Core, cage, and endcaps: polypropylene
  • O-ring options: ethylene propylene (EPR)
Removal ratings
  • 100 nm
Configurations
  • Nominal length:

             102 mm / 4 in, 254 mm / 10 in, 508 mm / 20 in, 762 mm / 30 in, 1016 mm / 40 in

  • Diameter:

             63 mm / 2.5 in

  • O-ring size / end caps:

             Code 19 (222 double O-ring flat end)
Operating conditions
  • Maximum operating temperature: 
             82°C / 180°F
  • Maximum differential pressure:

            0.41 MPa @ 30°C / 60 psid @ 85°F

            0.34 MPa @ 50°C / 50 psid @ 120°F

            0.2 MPa @ 70°C / 30 psid @ 160°F

            0.1 MPa @ 82°C / 15 psid @ 180°F

Documents

Data Sheets

  • Profile® Nano Filters for CMP Applications

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