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Custom Gas Purifier Systems

Custom Gas Purifier Systems product photo Primary L
Pall purifier systems enable the removal of molecular contamination to sub-parts-per-billion (ppb) levels from a variety of gases used in the semiconductor, photovoltaic, LED and display industries. They are well suited for applications such as bulk delivery and gas bottle filling.
  • Flow rates up to 4,000 slpm (141 scfm)
  • Purifier assemblies contain integral particle filters
  • Isolation valves allow for easy replacement of individual assemblies
  • Custom configurations available to meet specific customer requirements

Products on this page may be covered by one or more patents, including US 7,465,692

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Pall purifier systems enable the removal of molecular contamination to sub-parts-per-billion (ppb) levels from a variety of gases used in the semiconductor, photovoltaic, LED and display industries. They are well suited for applications such as bulk delivery and gas bottle filling.
  • Flow rates up to 4,000 slpm (141 scfm)
  • Purifier assemblies contain integral particle filters
  • Isolation valves allow for easy replacement of individual assemblies
  • Custom configurations available to meet specific customer requirements

Products on this page may be covered by one or more patents, including US 7,465,692

 
 
Purifiable Gases and Removal Efficiency See Table 1
Materials
  • All wetted surfaces are electropolished 316L stainless steel (except for the purification material)
  • ≤ 0.25 μm / 10 μin Ra internal surface finish
  • Housings meet or exceed VIM / VAR specifications
Particle Removal Rating1
  • ≥ 0.4 μm (3 nm particle filter assemblies Removal available as stand-alone units)
Housing Pressure Ratings
  • Standard pressure: 1.7 MPa (250 psig)
  • High pressure: 20.7 MPa (3,000 psig)
Configurations
  • Manifold contains 1 to 4 assemblies to accommodate flow rates up to 4,000 slpm (141 scfm)
  • Available with customer specific connections and components
Certifications
  • ASME: Vessel is designed and manufactured in accordance with the ASME BPVC Section III, Div 1 and is U-stamped
  • PED: Available for most categories of gases
Leak Rating
  • Assemblies are 100% helium leak tested to 1 x 10-9 atm-cm3/s
 
1 Particle rating is based on laboratory testing with NaCl aerosol.

Nominal Dimensions

Table 1: List of Purifiable Gases

 
Gas Purifier Material Code Effluent Material Specification2
Nitrogen, argon, helium, xenon, krypton, neon INP <1 ppb H2O, O2, CO2 and CO
Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether SIP <1 ppb H2O, O2, CO2 and CO
Carbon monoxide SIP <1 ppb H2O, O2, CO2, Ni(CO)4 and Fe(CO)5
Fluoromethane, diflouromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane FCP <1 ppb H2O, O2, and CO2
Germane GEH4P <1 ppb H2O, O2, and CO2
Sulfur hexafluoride SF6P <1 ppb H2O, O2, and CO2
Air, carbon dioxide, oxygen, nitrous oxide OXP <10 ppb H2O
Boron trichloride, chlorine, trichlorosilane, dichlorosilane CLXP <100 ppb H2O
Hydrogen chloride HCLP <15 ppb H2O
Hydrogen bromide HBRP <50 ppb H2O
Photolithography clean dry air CDAP <1 ppb H2O,
<1 ppb organics (as C4),
<10 ppt acid gases (as SO2),
<15 ppt basic gases (as NH3),
<1 ppt refractory compounds (as HMDSO)
 
2 Gas specific data available upon request.
Systems

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