Gaskleen® II EL Purifier Assembly product photo Primary L

Gaskleen® II EL Purifier Assembly

Gaskleen® II EL Purifier Assembly

Pall Gaskleen II EL purifier assemblies are designed to remove molecular contamination from many process gases. Sub-parts-per-billion (ppb) level purification is achieved for flow rates up to 30 slpm, with excursions up to 50 slpm1, while providing ≥ 3 nanometer (nm) particle removal.

  • Controls and removes impurities such as moisture, oxygen, carbon dioxide, non-methane hydrocarbons, metal carbonyls, and siloxanes
  • 316L stainless steel housing
  • Wide variety of gases purified
  • 100% helium leak and pressure tested
  • Not orientation sensitive
  • No detectable metal contribution above background in HCl gas with HCLP materia
  • No detectable metal contribution above background in HBr gas with HBRP material


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Description

Gaskleen® II EL Purifier Assembly

Pall Gaskleen II EL purifier assemblies are designed to remove molecular contamination from many process gases. Sub-parts-per-billion (ppb) level purification is achieved for flow rates up to 30 slpm, with excursions up to 50 slpm1, while providing ≥ 3 nanometer (nm) particle removal.

  • Controls and removes impurities such as moisture, oxygen, carbon dioxide, non-methane hydrocarbons, metal carbonyls, and siloxanes
  • 316L stainless steel housing
  • Wide variety of gases purified
  • 100% helium leak and pressure tested
  • Not orientation sensitive
  • No detectable metal contribution above background in HCl gas with HCLP materia
  • No detectable metal contribution above background in HBr gas with HBRP material
Specifications
Materials
  • Housing: electropolished 316L SS
  • ≤ 0.25 μm / 10 uin Ra internal surface finish
  • Housing meets or exceeds VIM / VAR specifications
Particle Removal Efficiency Rating
  • 109 reduction for particles ≥ 3 nm up to 50 slpm2
Connections
  • ¼” Gasket Seal, Male / Male (VCR3 or compatible)
Operating Conditions
    • Maximum operating pressure : 6.9 MPa @ 100C/ 1,000 psig @ 212°F
    • Maximum operation temperature: 100°C /212°F (INP, SIP, FCP, SF6P) 40°C/ 104°F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
    • EU Pressure Equipment Directive: Assemblies comply with the European Union's Pressure Equipment Directive 2014/68/EU and are CE marked
Packaging
    • Double bagged
    • Aluminized outer bag, polyethylene inner bag
    • End fittings sealed with metal gaskets and caps
    • Product sealed in an argon environment

1Contact the Pall Microelectrnics group for further information.
2Particle rating based on laboratory testing with NaCl erosol.
3VCR is a trademark of Swagelok Co.

Type
Purifiers
Use
Gas Filtration, Purification
Additional Information

Technical Information

Impurity Removal as Tested in Specific Gases

Specific Gas Impurity Removal Efficiency
Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether, Ethylene, Propylene, Carbonyl Sulfide < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen, and hydrogen using APIMS analyzer
< 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer
H2O and siloxanes removed to trace levels as tested in silane using APIMS
Carbon Monoxide < 10 ppb Ni(CO)4 and < 1 ppb Fe(CO)5 as tested in carbon monoxide using GC-ECD analyzer
Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane < 1 ppb H2O, CO2, and CO as tested in argon and nitrogen using APIMS analyzer
< 1 ppb O2 as tested in trifluoromethane using trace oxygen analyzer
< 10 ppb H2O as tested in trifluomethane using trace moisture analyzer and FTIR
Germane < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS
Sulfur Hexafluoride < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen
Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide < 1 ppb H2O and CO2 as tested in argon using APIMS analyzer
Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane < 1 ppb H2O and CO2 as tested in argon using APIMS analyzer
Hydrogen Chloride < 15 ppb H2O as tested in hydrogen chloride using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Hydrogen Bromide < 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography Clean Dry Air < 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction


Dimensions



Ordering Information

Part Numbers / Ordering Information

Part Number Specification Specific Gas Effluent Impurity Specifications
GLP6INPVMM4 Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon < 1 ppb H2O, CO2, O2, CO
GLP6SIPVMM4 Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether, Ethylene, Propylene, Carbonyl Sulfide Carbon Monoxide < 1 ppb H2O, CO2, O2, CO
< 1 ppb H2O, O2, CO2, Fe(CO)5 < 10 ppb Ni(CO)4
GLP6FCPVMM4 Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane < 1 ppb H2O, CO2, O2
GLP6GEH4PVMM4 Germane < 1 ppb H2O, CO2, O2, CO
GLP6SF6PVMM4 Sulfur Hexafluoride < 1 ppb H2O, CO2, O2, CO
GLP6OXPVMM4 Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide < 10 ppb H2O
GLP6CLXPVMM4 Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane < 100 ppb H2O
GLP6HCLPVMM4 Hydrogen Chloride < 15 ppb H2O
GLP6HBRPVMM4 Hydrogen Bromide < 50 ppb H2O
GLP6CDAPVMM4 Photolithography clean dry air < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO)


Application
Process gas purification, Process gas purification