The Pall UltiKleen G2 KC assembly is a completely disposable filter unit. It has greatly improved flow characteristics over traditional assembly designs making it ideally suited for process chemical applications for 300 mm wafer fabrication processes. The laid-over pleat filter design increases the effective filter area to 2.2 m2 in a compact size. The result is longer service life as well as high flows. The built-in UltiKleen cartridge is acid cleaned prior to shipment to ensure low metal ion content. The UltiKleen G2 KC assembly provides excellent chemical and thermal resistance making it the preferred choice for most semiconductor chemical process applications.

The UltiKleen G2 KC assembly is an ideal upgrade filter for enhanced filter performance.

Features

• Optimized laid-over pleat construction almost doubles filter area compared to standard pleat geometry
• A disposable filter unit with the filter cartridge integrally sealed in the housing
• Low extractables Me-KleenSM option available to ensure low metals content.
• Sealed assembly improves safe handling and disposal of hazardous chemicals
• Flow characteristics greatly improved, suitable for 300 mm processes
• System design and retrofit made easy with T-flow, In-line and L-flow options
• 100% integrity tested