UltiKleen™ G3 Excellar ER KC Assemblies product photo Primary L

UltiKleen™ G3 Excellar ER KC Assemblies

The UltiKleen G3 Excellar ER filter combines enhanced retention (ER) and improved non-dewetting properties to enable semiconductor makers to meet the critical chemical process filtration requirements beyond the 45 nm manufacturing node.

The UltiKleen G3 Excellar ER filter media is made using Pall's proprietary Molecular Surface Tailoring (MST) technology. The advanced PTFE membrane has a hyperfine pore matrix design that provides a significant improvement in the retention of deep sub-micron size particles. Designed for critical single-pass point-of-use retention requirements, the UltiKleen G3 Excellar ER filter demonstrates a high flow rate that makes it suitable for recirculation bath applications.

Pall's non-chemical additive MST process increases the UltiKleen G3 Excellar ER filter's wettability in aqueous chemicals including SPM, SC-1 and SC-2. Pall's advanced ultra low extractables Me-KleenSM K7 post-treatment process is also available to reduce metal ion extractables to a low single digit ppb total.

The UltiKleen G3 KC assembly has a slightly larger diameter while maintaining the same face-to-face sealing distance as the UltiKleen G2 KC (T– flow) assembly. The increased diameter accommodates a larger format UltiKleen Excellar ER filter with significantly increased filter area for increased flow rates and longer service life.

Features

  • Enhanced retention (ER) of particles
  • Hyperfine PTFE media matrix design
  • Increased filer area of 4.4 m2/47.4 ft2
  • High flow rates
  • All ultra high purity fluoro-polymer construction
  • Low extractables (Me-Kleen option is available)
  • Provided fully prewet with ultrapure water as standard
  • Downstream core vent reduces potential for bubble collection and premature blockage


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Description
The UltiKleen G3 Excellar ER filter combines enhanced retention (ER) and improved non-dewetting properties to enable semiconductor makers to meet the critical chemical process filtration requirements beyond the 45 nm manufacturing node.

The UltiKleen G3 Excellar ER filter media is made using Pall's proprietary Molecular Surface Tailoring (MST) technology. The advanced PTFE membrane has a hyperfine pore matrix design that provides a significant improvement in the retention of deep sub-micron size particles. Designed for critical single-pass point-of-use retention requirements, the UltiKleen G3 Excellar ER filter demonstrates a high flow rate that makes it suitable for recirculation bath applications.

Pall's non-chemical additive MST process increases the UltiKleen G3 Excellar ER filter's wettability in aqueous chemicals including SPM, SC-1 and SC-2. Pall's advanced ultra low extractables Me-KleenSM K7 post-treatment process is also available to reduce metal ion extractables to a low single digit ppb total.

The UltiKleen G3 KC assembly has a slightly larger diameter while maintaining the same face-to-face sealing distance as the UltiKleen G2 KC (T– flow) assembly. The increased diameter accommodates a larger format UltiKleen Excellar ER filter with significantly increased filter area for increased flow rates and longer service life.

Features

  • Enhanced retention (ER) of particles
  • Hyperfine PTFE media matrix design
  • Increased filer area of 4.4 m2/47.4 ft2
  • High flow rates
  • All ultra high purity fluoro-polymer construction
  • Low extractables (Me-Kleen option is available)
  • Provided fully prewet with ultrapure water as standard
  • Downstream core vent reduces potential for bubble collection and premature blockage
Specifications

Materials of Construction

 
Filter medium: Surface modified PTFE
Media support: PFA
Inner core: PFA
Outer cage: PFA
End caps: PFA
Housing: PFA
 

 
Removal Rating 20 nm
Configurations T-flow, In-line
Nominal Filter Area 4.4 m2 / 47.4 ft2
Maximum Operating Temperature 170 ºC / 338 ºF
Maximum Operating Pressure 0.49 MPaG (71 psig) @ 25 ºC (77 ºF)
0.39 MPaG (57 psig) @ 60 ºC (140 ºF)
0.34 MPaG (49 psig) @ 90 ºC (194 ºF)
0.20 MPaG (29 psig) @ 120 ºC (248 ºF)
0.15 MPaG (22 psig) @ 150 ºC (302 ºF)
0.12 MPaG (17 psig) @ 170 ºC (338 ºF)
 

Dimensions


1 inch In-Line
Flare Style
LDFHN1GPK164E51

1 inch In-Line Flare Style LDFHN1GPK164E51

1 inch In-Line
Super Pillar 300P Series
LDFHN1GPK164E71
1 inch In-Line Super Pillar 300P Series LDFHN1GPK164E71

3⁄4 inch T-Flow
Super Pillar 300P Series
LDFHT1GPK12E71/72
3⁄4 inch T-Flow Super Pillar 300P Series LDFHT1GPK12E71/72

1 inch T-Flow
Super Pillar 300P Series
LDFHT1GPK16E71/72
1 inch T-Flow Super Pillar 300P Series LDFHT1GPK16E71/72

Performance

Pressure Drop vs. Liquid Flow Rate1


1 inch T-flow, In-line

1 inch T-flow, In-line

34 inch T-flow

3⁄4 inch T-flow
1 For liquids other than water, multiply differential pressure by fluid viscosity (cP).

Unit conversion: 1 bar = 0.1 MPa
Type
Assemblies, Capsules
Ordering Information
Pall Part Number = LDFH [1] 1GPK [2] E [3] [4]

Table 1

 
Code Flow
T T-flow
N In-line
 

Table 22

 
Code Inlet/outlet Vent/drain Memo
Head end Bowl end
12 34 in. male 12 in. male 12 in. female T-flow
128 34 in. male 12 in. male 12 in. male T-flow
16 1 in. male 12 in. male 12 in. female T-flow
164 1 in. male 14 in. male 14 in. male In-line
168 1 in. male 12 in. male 12 in. male T-flow
 

Table 3

 
Code Connections
2 Super Pillar Type (Nippon Pillar)3
51 Flare style
71 Super Pillar 300 P Series (Nippon Pillar)
72 Super Pillar 300 P Series L Type (Nippon Pillar)
 

Table 4

 
Code Prewet option
-K3 Prewet filter (packaged in DI water)
-K7 Prewet filter (packaged in DI water), low metal extractables4
 
2 Disposable capsules are not available with every option. Please contact Pall for the part number availability.
3 Pillar is a trademark of Nippon Pillar Packing Co.
4 Please contact Pall for the extractable conditions.
Application
Chemicals