XpressKleen™ G3 KC Assemblies product photo Primary L

XpressKleen™ G3 KC Assemblies

The XpressKleen™ G3 filter advances PTFE membrane filtration to enable semiconductor makers to meet the critical chemical filtration requirements of leading edge device manufacturing processes. The XpressKleen filter provides control of critical size particles as well as maintaining critical fluid purity with a guarantee of less than 3 ppb of total metal ion extractables per single length filter. The XpressKleen filter’s surface cleanliness includes removal of organic contamination and surface particles. This makes the filter suitable for use from the point of supply (POS) to point of process (POP) to help define a contamination control system that delivers the required fluid purity to the wafer. This is accomplished by Pall’s completely integrated manufacturing capability that extends from the PTFE resin to the finished filter device. Pall’s advanced manufacturing process (AMP), incorporates the latest clean room manufacturing and state-of-the-art proprietary cleaning steps with improved statistical process control to ensure reliability and performance.

The XpressKleen G3 KC assembly has a slightly larger diameter while maintaining the same face-to-face sealing distance as the XpressKleen G2 KC (T-flow) assembly. The increased diameter accommodates a larger format XpressKleen filter with significantly increased filter area for increased flow rates and longer service life.

The XpressKleen G3 filter medium is made using Pall’s proprietary Molecular Surface Tailoring (MST) technology. The nondewetting XpressKleen G2 filter is qualified for use in aggressive high temperature cleaning chemistries, including aqueous chemistries such as SC1 and SC2.
  • Low extractables
  • > 40 nm particle rinse up control in UPW1
  • TOC control
  • 100% prewetted shipment with ultrapure water package
  • High flow rates
  • T-flow G3 KC assembly available with downstream venting
  • Disposable filter unit with filter cartridge integrally sealed in housing
  • Sealed assembly for safer handling and faster changeout
  • 100% integrity tested
1>20nm particle rinse up control in UPW for 5 nm grade


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Description
The XpressKleen™ G3 filter advances PTFE membrane filtration to enable semiconductor makers to meet the critical chemical filtration requirements of leading edge device manufacturing processes. The XpressKleen filter provides control of critical size particles as well as maintaining critical fluid purity with a guarantee of less than 3 ppb of total metal ion extractables per single length filter. The XpressKleen filter’s surface cleanliness includes removal of organic contamination and surface particles. This makes the filter suitable for use from the point of supply (POS) to point of process (POP) to help define a contamination control system that delivers the required fluid purity to the wafer. This is accomplished by Pall’s completely integrated manufacturing capability that extends from the PTFE resin to the finished filter device. Pall’s advanced manufacturing process (AMP), incorporates the latest clean room manufacturing and state-of-the-art proprietary cleaning steps with improved statistical process control to ensure reliability and performance.

The XpressKleen G3 KC assembly has a slightly larger diameter while maintaining the same face-to-face sealing distance as the XpressKleen G2 KC (T-flow) assembly. The increased diameter accommodates a larger format XpressKleen filter with significantly increased filter area for increased flow rates and longer service life.

The XpressKleen G3 filter medium is made using Pall’s proprietary Molecular Surface Tailoring (MST) technology. The nondewetting XpressKleen G2 filter is qualified for use in aggressive high temperature cleaning chemistries, including aqueous chemistries such as SC1 and SC2.
  • Low extractables
  • > 40 nm particle rinse up control in UPW1
  • TOC control
  • 100% prewetted shipment with ultrapure water package
  • High flow rates
  • T-flow G3 KC assembly available with downstream venting
  • Disposable filter unit with filter cartridge integrally sealed in housing
  • Sealed assembly for safer handling and faster changeout
  • 100% integrity tested
1>20nm particle rinse up control in UPW for 5 nm grade
Specifications

Materials of Construction

Components Materials2
Filter Medium Surface-modified PTFE
Media Support PFA
Core, cage and end caps PFA
Housing PFA
2 All fluoro-polymer materials made without PFOA.

Removal Ratings and Operating Conditions

Removal Ratings 5 nm | 10 nm | 12 nm | 15 nm
Filter area 4.3 m2/46.3 ft2 | 4.3 m2/46.3 ft2 | 3.3 m2/35.5 ft2 | 4.4 m2/47.4 ft2
Metal extractables < 0.75 ppb4 | < 1 ppb3 | < 3 ppb3
Flow T-flow, In-line
Maximum Operating Temperature 180 ºC / 356 ºF
Maximum Operating Pressure 0.49 MPaG (71 psig) @ 25 ºC (77 ºF)
0.39 MPaG (56.6 psig) @ 60 ºC (140 ºF)
0.34 MPaG (49.3 psig) @ 90 ºC (194 ºF)
0.20 MPaG (29.0 psig) @ 120 ºC (248 ºF)
0.15 MPaG (21.8 psig) @ 150 ºC (302 ºF)
0.12 MPaG (17.4 psig) @ 180 ºC (356 ºF)
3 Total metal concentrations in 13 elements: Li, Na, Mg, Al, K, Ca, Cr, Mn, Fe, Ni, Cu, Zn, Pb.
4 Total metal concentrations in 19 elements: Al, Ba, B, K, Na, Fe, Li, Mg, Mn, Pb, Sn, Ti, Zn, Ni, Cu, Cr, Co, Ca, Ag.

Dimensions




5 Pillar is a trademark of Nippon Pillar Packing Co.
Performance

Typical Flow Characteristics - 1cP fluid, 20℃


Type
Filter Capsules
Ordering Information
Part Number6 = LDFH [Table 1] 1XP [Table 2] [Table 3] E [Table 4]

Table 1

Code Flow
T T-flow
N In-line

Table 2

Code Removal ratings
5 5 nm
10 10 nm
12 12 nm
15 15 nm

Table 3

Code Inlet/Outlet Vent/Drain Type
Head end Bowl end
12 34 in male 12 in male 12 in female T-flow
128 34 in male 12 in male 12 in male T-flow
16 1 in male 12 in male 12 in female T-flow
164 1 in male 14 in male 14 in male In-line
168 1 in male 12 in male 12 in male T-flow, In-line
6 Disposable capsules are not available with every option. (Refer to codes for options.) Contact your local Pall representative for option availability.


Table 4

Code Connections
2 Super Pillar Type8
51 Flare style
71 Super Pillar 300 P Series
72 Super Pillar 300 P Series L Type
Application
Chemicals, Wet etch & cleans