Asymmetric P-Nylon Filter (Lithography) product photo Primary L

Asymmetric P-Nylon Filter (Lithography)

The Asymmetric P-Nylon filter utilizes the proven defect reducing Nylon membranes configured into a new asymmetric pore geometry. This tapered pore design, with an open upstream structure and a fine downstream region, enables extremely low operating pressures. The Nylon Effect1, which has proven to significantly reduce microbridge and cone defects in 193nm resist and BARC chemistries can now be applied to all lithography applications. The XP option is available for advanced lithography processes.

Features

  • Naturally hydrophilic (no surface modifications)
  • Quick venting
  • 100% integrity tested
  • Manufactured in a cleanroom environment
  • Reduces defects by sieving and adsorption
  • Minimized organic extractables by XP option
  • XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.

Benefits

  • Reduce filter start-up and tool downtime
  • Minimize chemical wastes
1 Adsorption of hardly soluble polymer components by the unique surface characteristics of the P-Nylon membrane.


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Description
The Asymmetric P-Nylon filter utilizes the proven defect reducing Nylon membranes configured into a new asymmetric pore geometry. This tapered pore design, with an open upstream structure and a fine downstream region, enables extremely low operating pressures. The Nylon Effect1, which has proven to significantly reduce microbridge and cone defects in 193nm resist and BARC chemistries can now be applied to all lithography applications. The XP option is available for advanced lithography processes.

Features

  • Naturally hydrophilic (no surface modifications)
  • Quick venting
  • 100% integrity tested
  • Manufactured in a cleanroom environment
  • Reduces defects by sieving and adsorption
  • Minimized organic extractables by XP option
  • XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.

Benefits

  • Reduce filter start-up and tool downtime
  • Minimize chemical wastes
1 Adsorption of hardly soluble polymer components by the unique surface characteristics of the P-Nylon membrane.
Specifications

Materials of Construction

 
Components Materials
Filter medium Asymmetric hydrophilic nylon 6,6
Support and drainage HDPE2
Core, cage and end caps HDPE
O-ring options FEP Encapsulated fluoroelastomer, Kalrez3
 
 
  ABD Filters
Removal Ratings 2 nm 5 nm 10 nm 20 nm 40 nm 0.15 μm
Filter Areas (10" / std. Dia.) 1.7 m2 1.1 m2 1.3 m2 1.3 m2 1.2 m2 1.2 m2
Filter Areas (10" / G2. Dia.) 2.2 m2
Maximum Operating Temperature 50 ˚C / 122 ˚F
Maximum forward differential pressure 275 kPa @ 20 ˚C / 40 psid @ 68 ˚F
 
1 Adsorption of hardly soluble polymer components by the unique surface characteristics of the P-Nylon membrane.
2 High density polyethylene.
3 Kalrez is a trademark of DuPont Performance Elastomers.
Performance

Typical Flow Characteristics - 1cP fluid (20℃)


Type
Cartridges and Elements
Ordering Information

Part Numbers / Ordering Information4, 5

ABD [1] [2] [3] E [4]

Table 1

 
Code Nominal length / dia (mm / in)
1 254 / 10 70 / 2.75
2 508 / 20 70 / 2.75
3 762 / 30 70 / 2.75
G1 254 / 10 82 / 3.25
G2 508 / 20 82 / 3.25
 

Table 2

 
Code Removal Ratings
XN2L 2 nm
HXN5 5 nm
AN01 10 nm
ANM 20 nm
AND 40 nm
AN15 0.15 μm
 

Table 3

 
Code Configurations
3 222 O-ring open end flat closed end
7 226 O-ring open end fin on closed end
8 222 O-ring open end fin on closed end
 

Table 4

 
Code O-ring Materials
H1 FEP Encapsulated fluoroelastomer
H11 Kalrez
 
4 Filter elements may not be available in all configurations. Contact your local Pall representative for availability.
5For XP treatment option, add -XP to the end of a part number for 10 - 20 nm removal ratings and 10 - 20 inches.
(XP treatment is standard for 2 nm / 5 nm product)
Application
Photolithography