PE-Kleen Filter(Lithography) product photo Primary L

PE-Kleen Filter(Lithography)

The PE-Kleen filter combines the latest advances in polyethylene membrane technology with Pall’s unique crescent-shaped Ultipleat® filter technology. The result is a cartridge with the outstanding particle retention characteristics required by the semiconductor industry.

The PE-Kleen filter is specifically designed for the filtration of ultra-high-purity chemicals. It is recommended for applications involving antireflective coatings and bulk filtration of 248 nm and 193 nm photoresist. The XP option is available for advanced lithography processes.

Features

  • Excellent gel-retention characteristics
  • High flow rates
  • Low extractables
  • 100% integrity tested
  • Manufactured in a cleanroom
  • Minimized organic extractables by XP option
  • XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.


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Description

The PE-Kleen filter combines the latest advances in polyethylene membrane technology with Pall’s unique crescent-shaped Ultipleat® filter technology. The result is a cartridge with the outstanding particle retention characteristics required by the semiconductor industry.

The PE-Kleen filter is specifically designed for the filtration of ultra-high-purity chemicals. It is recommended for applications involving antireflective coatings and bulk filtration of 248 nm and 193 nm photoresist. The XP option is available for advanced lithography processes.

Features

  • Excellent gel-retention characteristics
  • High flow rates
  • Low extractables
  • 100% integrity tested
  • Manufactured in a cleanroom
  • Minimized organic extractables by XP option
  • XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.
Specifications

Materials of Construction

 
Components Materials
Filter medium HDPE 1
Support and drainage HDPE
Core, cage and end caps HDPE
O-ring options EPR, FEP Encapsulated fluoroelastomer, Kalrez 2, Chemraz 3
 

1 High Density Polyethylene.
2 Kalrez is a trademark of DuPont Performance Elastomers.
3 Chemraz is a trademark of Greene, Tweed & Co.


 
  ABD Filters
Removal Ratings 2 nm 5 nm 10 nm 30 nm 0.05 μm 1.0 μm
Filter Areas 1.3 m2 1.3 m2 1.3 m2 1.1 m2 1.4 m2 1.1 m2
Maximum Operating Temperature 50 ˚C / 122 ˚F
Maximum forward differential pressure 340 kPa @ 40 ˚C / 49 psid @ 104 ˚F
 
Performance

Pressure Drop vs. Liquid flow Rate (Water, 20 °C)4






4For liquids other than water, multiply the differential pressure by fluid viscosity in centipoise.
Type
Filter Cartridges
Ordering Information

Part Numbers / Ordering Information5, 6

ABD [1] UG [2] [3] E [4]


Table 1

 
Code Nominal length (mm / in)
1 254 / 10
2 508 / 20
3 762 / 30
 

Table 2

 
Code Removal Ratings
2 2 nm
5 5 nm
001 10 nm
003 30 nm
005 0.05 μm
100 1.0 μm
 

Table 3

 
Code Configurations
3 222 O-ring open end flat closed end
7 226 O-ring open end fin on closed end
8 222 O-ring open end fin on closed end
 

Table 4

 
Code O-ring Materials
J EPR
H1 FEP Encapsulated fluoroelastomer
H11 Kalrez
H12 Chemraz
 

5Filter elements may not be available in all configurations. Contact your local Pall representative for availability.
6For XP option, add –XP to end of part number for 2 - 10nm removal ratings and 10 - 20 inches.
Application
Photolithography, Solvent filtration