PE-Kleen G2 Filters and PE-Kleen SWD Capsules product photo Primary L

PE-Kleen G2 Filters and PE-Kleen SWD Capsules

The PE-Kleen G2 filter combines the latest advances in polyethylene membrane technology with Pall’s unique crescent-shaped Ultipleat® filter technology. The result is a cartridge with the outstanding particle retention characteristics required by the semiconductor industry.

The PE-Kleen G2 filter is specifically designed for the filtration of ultra-high-purity chemicals, including organic stripper and DHF.

The PE-Kleen SWD capsules are space-saving filter units. They are ideally suited for installing into single wafer cleaning systems.

Features

  • Excellent gel-retention characteristics
  • High flow rates
  • Low extractables
  • 100% integrity tested
  • Manufactured in a cleanroom environment
  • 100% prewetted with ultrapure water in package
  • Compact space-saver capsules


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Description

The PE-Kleen G2 filter combines the latest advances in polyethylene membrane technology with Pall’s unique crescent-shaped Ultipleat® filter technology. The result is a cartridge with the outstanding particle retention characteristics required by the semiconductor industry.

The PE-Kleen G2 filter is specifically designed for the filtration of ultra-high-purity chemicals, including organic stripper and DHF.

The PE-Kleen SWD capsules are space-saving filter units. They are ideally suited for installing into single wafer cleaning systems.

Features

  • Excellent gel-retention characteristics
  • High flow rates
  • Low extractables
  • 100% integrity tested
  • Manufactured in a cleanroom environment
  • 100% prewetted with ultrapure water in package
  • Compact space-saver capsules
Specifications

Materials of Construction

 
Components Materials
Filter Medium HDPE (High density polyethylene)
Support and drainage HDPE
Core,cage and end caps HDPE
Housing HDPE
O-ring options FEP encapsulated fluoroelastomer, Kalrez2, Chemraz3
 

1 Package is completely filled with ultrapure water.
2 Kalrez is a rademark of DuPont Performance Elastomers.
3 Chemraz is a trademark of Greene, Tweed & Co


 
Product Name PE-Kleen G2 Filters PE-Kleen SWD Capsules
Removal Ratings 10 nm 5 nm, 10 nm
Configurations ABDG type cartridge U-flow capsule
Nominal Filter Areas ABDG1 2.6 m2 / 28 ft2
ABDG2 5.2 m2 / 56 ft2
ABDG3 7.8 m2 / 84 ft2
0.28 m2 / 3.0 ft2
Maximum Operating Temperature 60 °C / 140 °F
Maximum forward differential pressure 0.34 MPa / 49 psid @ 40 °C / 104 °F  
Maximum Operating Pressure   0.35 MPaG / 51 psig ‹ 38 °C / 100 °F
0.17 MPaG / 25 psig ‹ 60 °C / 140 °F
 
Performance

Typical Flow Characteristics – 1 cP fluid, 20 °C



Type
Cartridges and Elements
Use
Filtration
Ordering Information

Part Numbers / Ordering Information4

PE-Kleen G2 Filter

ABDG [1] UG [2] [3] E [4] [5]

Table 1

 
Code Nominal length (mm / in)
1 241 / 9.5
2 484 / 19.1
3 723 / 28.5
 

Table 2

 
Code Removal ratings
001 10 nm
 

Table 3

 
Code Configurations
3 222 O-ring open end flat closed end
 

Table 4

 
Code O-ring materials
H1 FEP encapsulated fluoroelastomer
H11 Kalrez
H12 Chemraz
 

Table 5

 
Code Packaging
K3 Prewet5
Blank Dry
 


PE-Kleen SWD Capsules

SWD03 [1] 4E71 [2]

Table 1

 
Code Removal Ratings
UG5 5 nm
UG001 10 nm
 

Table 2

 
Code Prewet Option
None Dry
-K13C Prewet filter (packaged in DI water), Low metal extractables6
 

Connections (Inlet / Outlet, Vent: ¼ in , Super Pillar 7 300 P series (Nippon Pillar)


4
Part numbers in combination with all codes are not always available. Please contact Pall for part number availability.
5
When K3 is not included in the part number, the filter will be packaged dry.
6
Please contact Pall for the extractable conditions.
7
Pillar is a trademark of Nippon Pillar Packing Co.
Application
Other, Chemicals, Photolithography, Wet etch & cleans
Segment
Data Storage
Semiconductor