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PhotoKleen™ EZD-3X Filter Capsules

The PhotoKleen™ EZD-3X filter is designed for small-volume dispense systems, which have the smallest footprint. The PhotoKleen™ EZD-3X filter has almost double the filter area (compared to the PhotoKleen™ EZD-3 filter) in the same capsule size. This allows for lower pressure drop during filtration or allows the installation of finer filtration at the same pressure drop. Two filter media types are available, Asymmetric Nylon 6,6 and HDPE. The naturally hydrophilic Nylon 6,6 membrane allows for spontaneous wettability, and its polarity has been shown to lower defectivity on the patterned wafers. The XP option is available for advanced lithography processes.

Features and Benefits

  • Double the filter area in the same size capsule (Ref. PhotoKleen™ EZD-3 filter)
  • Easy change out style filter assembly
  • Two membrane material types available
  • Minimized hold-up volume, and top in / top out flow direction with side conduit for laminar filling
  • Offers lower pressure drop for higher viscosity fluids
  • Reduces tool down time by extending filter change outs
  • Optimized media selection for target applications
  • Minimized organic extractables by XP treatment for rapid start-up and reducing chemical wastes.
  • XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.

PhotoKleen™ EZD-3X filters are designed to fit into all PhotoKleen™ EZD-3 head manifolds
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Description
The PhotoKleen™ EZD-3X filter is designed for small-volume dispense systems, which have the smallest footprint. The PhotoKleen™ EZD-3X filter has almost double the filter area (compared to the PhotoKleen™ EZD-3 filter) in the same capsule size. This allows for lower pressure drop during filtration or allows the installation of finer filtration at the same pressure drop. Two filter media types are available, Asymmetric Nylon 6,6 and HDPE. The naturally hydrophilic Nylon 6,6 membrane allows for spontaneous wettability, and its polarity has been shown to lower defectivity on the patterned wafers. The XP option is available for advanced lithography processes.

Features and Benefits

  • Double the filter area in the same size capsule (Ref. PhotoKleen™ EZD-3 filter)
  • Easy change out style filter assembly
  • Two membrane material types available
  • Minimized hold-up volume, and top in / top out flow direction with side conduit for laminar filling
  • Offers lower pressure drop for higher viscosity fluids
  • Reduces tool down time by extending filter change outs
  • Optimized media selection for target applications
  • Minimized organic extractables by XP treatment for rapid start-up and reducing chemical wastes.
  • XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.

PhotoKleen™ EZD-3X filters are designed to fit into all PhotoKleen™ EZD-3 head manifolds
Specifications
 

Materials of Construction

 
Components Materials
Filter Media
  • P-Nylon : Hydrophilic Asymmetric Nylon6,6
  • PE-Kleen: High Density Polyethylene (HDPE)
Support and Drainage High Density Polyethylene (HDPE)
Core, Cage, and End Caps High Density Polyethylene (HDPE)
Housing High Density Polyethylene (HDPE)
O-ring Kalrez *1
 
*1 Kalrez is a registered trademark of E. I. du Pont de Nemours and Company


 
Removal Ratings
  • P-Nylon :2 nm, 5 nm, 20 nm, 40 nm, 0.15 μm
  • PE-Kleen : 2 nm, 5 nm, 10 nm, 30 nm, 50 nm
Filter area
  • P-Nylon:
    • 2 nm : 1,600 cm2
    • 5 nm : 1,200 cm2
    • 10, 20, 40 nm, 0.15 μm  : 1300 cm2
  • PE-Kleen:
    • 2, 5, 10, 30 nm : 1400 cm2
    • 50 nm: 1500 cm2
Maximum Forward Differential Pressure P-Nylon : 0.27 MPa @ 20 °C / 39 psid @ 60 °F
PE-Kleen : 0.29 MPa @ 30 °C / 42 psid @ 86 °F
Maximum Operating Temperature 30 °C / 86 °F
Maximum Operating Pressure 0.29 MPaG @ 30 °C / 42 psig @ 86 °F
 

Dimensions2



*2 PhotoKleen™ EZD-3 head manifolds are compatible with PhotoKleen™ EZD-3X capsules.
Performance

Typical Flow Characteristics - 1cP fluid, 20℃







Type
Filter Capsules
Ordering Information
 

Part Numbers / Ordering Information3

PHD12 [1] EH11B

Table 1

 
Code Filter Media Removal ratings
XN2L4 P-Nylon Asymmetric Nylon6,6 2 nm
HXN54 Asymmetric Nylon6,6 5 nm
AN01 Asymmetric Nylon6,6 10 nm
ANM Asymmetric Nylon6,6 20 nm
AND Asymmetric Nylon6,6 40 nm
AN15 Asymmetric Nylon6,6 0.15 μm
UG2 PE-Kleen HDPE 2 nm
UG5 HDPE 5 nm
UG001 HDPE 10 nm
UG003 HDPE 30 nm
UG005 HDPE 50 nm
*3 For XP option add –XP to end of part number for 10nm / 20nm removal ratings.
*4 XP treatment is standard on 2nm / 5nm removal rating.
Application
Photolithography