The PE-Kleen filter combines the latest advances in polyethylene membrane technology with Pall’s unique crescent-shaped Ultipleat® filter technology. The result is a cartridge with the outstanding particle retention characteristics required by the semiconductor industry.
The PE-Kleen filter is specifically designed for the filtration of ultra-high-purity chemicals. It is recommended for applications involving antireflective coatings and bulk filtration of 248 nm and 193 nm photoresist. The XP option is available for advanced lithography processes.
- Excellent gel-retention characteristics
- High flow rates
- Low extractables
- 100% integrity tested
- Manufactured in a cleanroom
- Minimized organic extractables by XP option
- XP option guarantees low organic, metal and particle cleanliness for the most advanced processes.
Materials of Construction
|Filter medium||HDPE 1|
|Support and drainage||HDPE|
|Core, cage and end caps||HDPE|
|O-ring options||EPR, FEP Encapsulated fluoroelastomer, Kalrez 2, Chemraz 3|
1 High Density Polyethylene.
2 Kalrez is a trademark of DuPont Performance Elastomers.
3 Chemraz is a trademark of Greene, Tweed & Co.
|Removal Ratings||2 nm||5 nm||10 nm||30 nm||0.05 μm||1.0 μm|
|Filter Areas||1.3 m2||1.3 m2||1.3 m2||1.1 m2||1.4 m2||1.1 m2|
|Maximum Operating Temperature||50 ˚C / 122 ˚F|
|Maximum forward differential pressure||340 kPa @ 40 ˚C / 49 psid @ 104 ˚F|
Pressure Drop vs. Liquid flow Rate (Water, 20 °C)4
4For liquids other than water, multiply the differential pressure by fluid viscosity in centipoise.
Part Numbers / Ordering Information5, 6
ABD  UG   E 
|Code||Nominal length (mm / in)|
|1||254 / 10|
|2||508 / 20|
|3||762 / 30|
|3||222 O-ring open end flat closed end|
|7||226 O-ring open end fin on closed end|
|8||222 O-ring open end fin on closed end|
|H1||FEP Encapsulated fluoroelastomer|