XpressKleen™ G2 filters & XpressKleen™ G2 KC Assemblies ( 5 nm) product photo Primary L

XpressKleen™ G2 filters & XpressKleen™ G2 KC Assemblies ( 5 nm)

Description

The XpressKleen G2 XP 5 nm filter represents a significant advance in the development of microporous PTFE membranes to meet the severe contamination control challenges that exist below the 14 nm manufacturing node. Pall Corporation’s material science team of scientists and engineers has created a new filter morphology unlike current designs using newly developed proprietary PTFE membrane manufacturing technology.

The revolutionary design provides unparalleled control of critical size particles greater than 5 nm combined with a new standard of device cleanliness and purity that guarantees less than 500 ppt of total metal ion extractables per single length filter1. Proprietary advanced cleaning methods produce a filter with ultra-low levels of organics, NVR, and transient surface borne particles.

Every aspect of the XpressKleen XP 5 nm filter, from the PTFE resin to the final package, is designed, controlled, and manufactured to deliver unparalleled and elevated performance that is consistent, repeatable, and a new standard in sub 7 nm particle retention.

The unique combination of low differential pressure and measured retention at 5 nm makes the filter suitable for use from the point of supply (POS) to the point of process (POP), in bulk delivery, recirculating batch filtration, and in single wafer applications.The XpressKleen 5 nm filter is an integral part of a contamination control system that enables particle and purity defect levels needed for 10 nm and finer manufacturing.

The nondewetting XpressKleen G2 filter is qualified for use in aggressive high temperature cleaning chemistries like SPM, H3PO4; concentrated chemicals like NH4OH, HCl, H2SO4, H2O2; IPA and other solvents; high ppm DIO3, and aqueous chemistries such as SC1 and SC2.

  • Low extractables < 500 ppt total of 19 elements
                                    < 0.1 ppb (Ni), < 0.2 ppb (Cu)
  • > 20nm particle rinse up control in UPW
  • TOC control
  • 100% prewetted shipment with ultrapure water package
  • High flow rates
  • G2 KC assembly available with downstream venting
  • Disposable filter unit with filter cartridge integrally sealed in housing
  • Sealed assembly for safer handling and faster changeout
  • 100% integrity tested
1 Total metal concentrations of 19 elements for KC Assemblies: Al, Ba, B, K, Na, Fe, Li, Mg, Mn, Pb, Sn, Ti, Zn, Ni, Cu, Cr, Co, Ca, Ag. Consult factory for details.


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Description

Description

The XpressKleen G2 XP 5 nm filter represents a significant advance in the development of microporous PTFE membranes to meet the severe contamination control challenges that exist below the 14 nm manufacturing node. Pall Corporation’s material science team of scientists and engineers has created a new filter morphology unlike current designs using newly developed proprietary PTFE membrane manufacturing technology.

The revolutionary design provides unparalleled control of critical size particles greater than 5 nm combined with a new standard of device cleanliness and purity that guarantees less than 500 ppt of total metal ion extractables per single length filter1. Proprietary advanced cleaning methods produce a filter with ultra-low levels of organics, NVR, and transient surface borne particles.

Every aspect of the XpressKleen XP 5 nm filter, from the PTFE resin to the final package, is designed, controlled, and manufactured to deliver unparalleled and elevated performance that is consistent, repeatable, and a new standard in sub 7 nm particle retention.

The unique combination of low differential pressure and measured retention at 5 nm makes the filter suitable for use from the point of supply (POS) to the point of process (POP), in bulk delivery, recirculating batch filtration, and in single wafer applications.The XpressKleen 5 nm filter is an integral part of a contamination control system that enables particle and purity defect levels needed for 10 nm and finer manufacturing.

The nondewetting XpressKleen G2 filter is qualified for use in aggressive high temperature cleaning chemistries like SPM, H3PO4; concentrated chemicals like NH4OH, HCl, H2SO4, H2O2; IPA and other solvents; high ppm DIO3, and aqueous chemistries such as SC1 and SC2.

  • Low extractables < 500 ppt total of 19 elements
                                    < 0.1 ppb (Ni), < 0.2 ppb (Cu)
  • > 20nm particle rinse up control in UPW
  • TOC control
  • 100% prewetted shipment with ultrapure water package
  • High flow rates
  • G2 KC assembly available with downstream venting
  • Disposable filter unit with filter cartridge integrally sealed in housing
  • Sealed assembly for safer handling and faster changeout
  • 100% integrity tested
1 Total metal concentrations of 19 elements for KC Assemblies: Al, Ba, B, K, Na, Fe, Li, Mg, Mn, Pb, Sn, Ti, Zn, Ni, Cu, Cr, Co, Ca, Ag. Consult factory for details.
Specifications

Materials of Construction2

 
Parts Material
Filter Medium Surface-modified PTFE
Media Support PFA
Core, cage and end caps PFA
Housing PFA
O-ring options3 FEP-encapsulated fluoroelastomer
 
2 All perfluoro-polymer materials made without PFOA.
3 Consult factory for other options.


Removal Ratings and Operating Conditions


Kleen-Change® (KC)
 
Removal Ratings 5 nm
Media Code XP5
Filter Area 2.8 m2
Flow Inline, L-flow, T-flow
Metallic extractables4 < 500 ppt4
TOC < 0.5 ppb5
Particle rinse up control < 10 pc/ml > 20 nm5
Resistivity 18 megohm in < 30 min @ 10 Lpm flush
Maximum Operating Temperature 185 °C / 365 °F
Maximum Operating Pressure 0.49 MPaG ( 71 psig) @ 25°C (77°F)
0.39 MPaG (56.6 psig) @ 60°C (140°F)
0.34 MPaG (49.3 psig) @ 90°C (194°F)
0.20 MPaG (29.0 psig) @ 120°C (248°F)
0.15 MPaG (21.8 psig) @ 150°C (302°F)
0.12 MPaG (17.4 psig) @ 185°C (365°F)
 

Cartridge
 
Removal Ratings 5 nm
Media Code XP5
Filter Area ABFG1 2.8 m2
Metallic extractables4 < 1 ppb4
TOC < 0.5 ppb5
Particle rinse up control < 10 pc/ml > 20 nm5
Resistivity 18 megohm in < 30 min @ 10 Lpm flush
Maximum Operating Temperature 185 °C / 365 °F
Maximum Differential Pressure 0.59 MPaG (85.6 psig) @ 50°C (120°F)
 
4 19 elements, consult factory for test conditions
5 After 40 min UPW flush @ 10 Lpm
Performance

Typical Flow Characteristics - 1cP fluid, 20℃


G2 cartridge

G2 cartridge

1" KC (In-line, T-flow)

1 inch KC (In-line, T-flow)

3/4" KC (L-flow, T-flow)

3/4 inch KC (L-flow, T-flow)

3/4" KC (In-line)

3/4 inch KC (In-line)
Type
Assemblies
Ordering Information

XpressKleen G2 KC Assemblies

LDF [1][2] 1XP [3][4] E [5]

Table 1

 
Code Downstream vent
G N/A
V Available
 

Table 2

 
Code Flow
T T-flow
N In-line
L L-flow
 

Table 3

 
Code Removal rating
5 5 nm
 

Table 4

 
Code Inlet/Outlet Vent/Drain Type
Head end Bowl end
12 3⁄4 in male 1⁄2 in male 1⁄2 in male T-flow/L-flow
12 3⁄4 in male 1⁄2 in male 1⁄2 in female DV type
12 3⁄4 in male 3⁄8 in male 3⁄8 in male In-line
124 3⁄4 in male 1⁄4 in male 1⁄4 in male In-line
128 3⁄4 in male 1⁄2 in male 1⁄2 in male DV type
13 3⁄4 in male 1⁄2 in female 1⁄2 in female T-flow
16 1 in male 1⁄2 in male 1⁄2 in male T-flow
16 1 in male 1⁄2 in male 1⁄2 in female DV type
16 1 in male 3⁄8 in male 3⁄8 in male In-line
164 1 in male 1⁄4 in male 1⁄4 in male In-line
168 1 in male 1⁄2 in male 1⁄2 in male DV type
17 1 in female 1⁄2 in female 1⁄2 in female In-line
 
DV : Downstream Venting


Table 56

 
Code Connections
1 20 series Flowell7
2 Super Pillar type8
51 Flare style
6 FinalLock9
71 Super Pillar 300 P series
72 Super Pillar 300 P series L type
8 60 series Flowell
9 11CR series Flowell
 
6 Disposable capsules are not available with every option. (Refer to codes for options.) Contact your local Pall representative for option availability.
7 Flowell is a trademark of Flowell Corporation.
8 Super Pillar is a trademark of Nippon Pillar Packing Co., Ltd.
9 FinalLock is a trademark of Kurabo Industries Ltd.


XpressKleen G2 Filter10


ABFG [1] XP [2] 3E [3]

Table 1

 
Code Length (Nominal)
Inch mm
1 10 225
2 20 468
 

Table 2

 
Code Removal rating
5 5 nm
 

Table 3

 
Code O-ring material
H1 FEP-encapsulated fluoroelastomer
H11 Kalrez11
H35 Perfrez12
 
10 Cartridges are shipped prewet as standard.
11 Kalrez is a trademark of DuPont Performance Elastomers.
12 Perfrez is a trademark of Applied Seals North America, Inc.