Gaskleen® II Gas Purifier product photo Primary L

Gaskleen® II Gas Purifier

A unique combination of Pall's leading edge AresKleen purification material combined with Ultramet-L® stainless steel filter media creating the industry's most advanced true point-of-use purifier.

The Gaskleen® II Purifier assembly is designed to remove contamination from most process gases. Sub ppb level purification is achieved at designed flow rates of up to 3 slpm while providing 0.003 μm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • One-for- one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316 L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Wide variety of gases purified
  • 100% helium leak and pressure tested
  • Compact size
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692


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Description
A unique combination of Pall's leading edge AresKleen purification material combined with Ultramet-L® stainless steel filter media creating the industry's most advanced true point-of-use purifier.

The Gaskleen® II Purifier assembly is designed to remove contamination from most process gases. Sub ppb level purification is achieved at designed flow rates of up to 3 slpm while providing 0.003 μm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • One-for- one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316 L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Wide variety of gases purified
  • 100% helium leak and pressure tested
  • Compact size
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692
Specifications

Materials

  • Electropolished 316 L stainless steel components
  • ≤ 10 μin / 0.25 μm Ra internal surface finish

Particle Removal Efficiency Rating

  • 1x109 retention of particles ≥ 0.003 μm up to 5 slpm

Connections

  • 14 in. Gasket Seal, Male/Male (VCR1 compatible)

Operating Conditions

  • Maximum Operating Pressure: 1000 psig / 69 bar
  • Maximum operating temperature:
    • 100 °C / 212 °F (INP, SIP, FCP, SF6P)
    • 40 ˚C / 104 ˚F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
  • EU Pressure Equipment Directive: Assemblies have been evaluated and are CE marked per the European Union's Pressure Equipment Directive 2014/68/EU

Design Flow Rate

  • 0- 3 slpm @ 15 psig / 1 bar
  • Higher intermittent flow rates of up to 5 slpm can be accommodated with reduced lifetime2

Packaging

  • Double bagged
  • Outer bag: aluminized mylar3
  • Inner bag: polyethylene
  • End fittings capped with metal seals
  • Product packaged in an argon environment

Dimensions

  • Length: 3.31 in. / 84 mm
  • Diameter: 1.36 in. / 34.5 mm
1 VCR is a trademark of Swagelok Co.
2 Contact the Pall Microelectronics Group for further information.
3 Mylar is a registered trademark of Dupont Teijin Films.


Technical Information

Impurity Removal as Tested in Specific Gases
Specific Gas Impurity Removal Efficiency
Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen and hydrogen using APIMS analyzer

< 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer

H2O and siloxanes removed to trace levels as tested in silane using APIMS
Carbon Monoxide < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5 as tested in carbon monoxide using GC-ECD analyzer
Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer

< 1 ppb O2 as tested in trifluoromethane using trace oxygen analyzer

< 10 ppb H2O as tested in trifluoromethane using trace moisture analyzer and FTIR
Germane < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Sulfur Hexafluoride < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS
Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide, Clean Dry Air < 10 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane < 100 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Hydrogen chloride < 15 ppb H2O as tested in hydrogen chloride using CRDS

< 1 ppb H2O as tested in argon using APIMS analyzer
Hydrogen Bromide < 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air < 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS Analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction

Unit conversion: 1 bar = 100 kilopascals
Performance

Pressure Drop vs. Gas Flow Rate

Pressure Drop vs. Gas Flow Rate GLP2INPVMM4

Lifetime Calculations

Pall AresKleen Purification Material: Inert Gas Service
Gaskleen II Purifier Assembly, Part # GLP2INPVMM4

Inlet Pressure: 30 psig (2.1 bar) Contaminant Challenge as H2O
Contaminant Challenge as H2O

Pall AresKleen Purification Material: Inert Gas Service Gaskleen II Purifier Assembly, Part # GLP2INPVMM4

Inlet Pressure: 30 psig (2.1 bar) Contaminant Challenge as O2
Contaminant Challenge as O2
Type
Purifiers
Use
Gas Filtration, Purification
Ordering Information
Part Number Specific Gas Effluent Purity Specifications
GLP2INPVMM4 Inert Gases: Nitrogen, Argon, Helium, Xenon, Krypton, Neon < 1 ppb H2O, O2, CO2, CO
GLP2SIPVMM4 Flammable Gases: Silane, Hydrogen, Methane, Ethane, Cyclopropane, Propane, Dimethyl Ether < 1 ppb H2O, CO2, O2, CO
  Carbon Monoxide < 1 ppb H2O, O2, CO2, Ni(CO)4, Fe(CO)5
GLP2FCPVMM4 Fluoromethane, Difluoromethane, Trifluoromethane, Tetrafluoroethane, Pentafluoroethane, Heptafluoropropane, Carbon Tetrafluoride, Perfluoropropane, Perfluorocyclobutane, Hexafluoroethane < 1 ppb H2O, CO2, O2
GLP2GEH4PVMM4 Germane < 1 ppb H2O, CO2, O2, CO
GLP2SF6PVMM4 Sulfur Hexafluoride < 1 ppb H2O, CO2, O2, CO
GLP2OXPVMM4 Oxygenated Gases: Carbon Dioxide, Oxygen, Nitrous Oxide < 10 ppb H2O
GLP2CLXPVMM4 Chlorinated Gases: Boron Trichloride, Chlorine, Trichlorosilane, Dichlorosilane < 100 ppb H2O
GLP2HCLPVMM4 Hydrogen Chloride < 15 ppb H2O
GLP2HBRPVMM4 Hydrogen Bromide < 50 ppb H2O
GLP2CDAPVMM4 Photolithography clean dry air < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO)

Unit conversion: 1 bar = 100 kilopascals
Application
Process gas purification, Process gas purification, Process gas purification
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