Maxi Gaskleen® Gas Purifier product photo Primary L

Maxi Gaskleen® Gas Purifier

The Maxi Gaskleen gas purifier is a unique combination of Pall's leading edge AresKleen™ purification material together with our Ultramet-L® stainless steel filter medium, creating the industry's most advanced true point-of-use purifier.

The Maxi GasKleen Purifier assembly is designed to remove contamination from most process gases. Sub ppb level purification is achieved at designed flow rates of up to 50 slpm while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and FE(CO)5
  • One-for-one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Wide variety of gases purified
  • 100% helium leak and pressure tested
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692


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Description
The Maxi Gaskleen gas purifier is a unique combination of Pall's leading edge AresKleen™ purification material together with our Ultramet-L® stainless steel filter medium, creating the industry's most advanced true point-of-use purifier.

The Maxi GasKleen Purifier assembly is designed to remove contamination from most process gases. Sub ppb level purification is achieved at designed flow rates of up to 50 slpm while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and FE(CO)5
  • One-for-one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Wide variety of gases purified
  • 100% helium leak and pressure tested
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692
Specifications

Materials

  • Electropolished 316 L stainless steel components
  • ≤ 0.25 μm / 10 μin Ra internal surface finish

Particle Removal Efficiency Rating

  • 1x109 retention of particles ≥ 3 nm up to 50 slpm

Connections

  • 14 in. Gasket Seal, Male/Male (VCR1 compatible)

Operating Conditions

  • Maximum operating pressure: 5.2 MPa / 750 psig
  • Maximum operating temperature:
    • 100 °C / 212 °F (INP, SIP, FCP, SF6P)
    • 40 °C / 104 °F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
  • EU Pressure Equipment Directive: Assemblies have been evaluated and are CE marked per the European Union's Pressure Equipment Directive 2014/68/EC.

Design Flow Rate

  • 0-50 slpm @ 0.1 MPa / 15 psig inlet
  • Intermittent flow rates up to 100 slpm can be accommodated with reduced lifetime2

Packaging

  • Double bagged Outer bag: aluminized mylar3 Inner bag: polyethylene
  • End fittings capped with metal seals
  • Product packaged in an argon environment

Dimensions

  • Length: 208 mm / 8.2 in.
  • Diameter: 63.5 mm / 2.5 in.
1 VCR is a trademark of Swagelok Co.
2 Contact the Pall Microelectronics Group for further information.
3 Mylar is a registered trademark of Dupont Teijin Films.


Technical Information

Impurity Removal as Tested in Specific Gases
Specific Gas Impurity Removal Efficiency
Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether < 1 ppb H2O, CO2, O2, and CO as tested in argon, nitrogen ydrogen using APIMS analyzer

< 1 ppb H2O as tested in carbon monoxide using trace moisture analyzer

H2O and siloxanes removed to trace levels as tested in silane using APIMS
Carbon monoxide < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5 as tested in carbon monoxide using GC-ECD analyzer
Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer

< 1 ppb O2 as tested in trifluoromethane using trace oxygen analyzer

< 10 ppb H2O as tested in trifluoromethane using trace moisture analyzer and FTIR
Germane < 1 ppb H2O, CO2, O2, and CO as tested in argon and nitrogen using APIMS analyzer
Sulfur hexafluoride < 1 ppb H2O, CO2, and O2 as tested in argon using APIMS
Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide, clean dry air < 10 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Hydrogen chloride < 15 ppb H2O as tested in hydrogen chloride using CRDS

< 1 ppb H2O as tested in argon using APIMS analyzer
Hydrogen bromide < 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air < 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS Analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction

Unit conversion: 100 kilopascals = 1 bar
Performance

Pressure Drop vs. Gas Flow Rate

GLP8INPVMM4

Lifetime Calculations

Pall AresKleen Purification Material: Inert Gas Service
Maxi Gaskleen Purifier Assembly, Part # GLP8INPVMM4

Inlet Pressure: 0.21 MPa / 30 psig Contaminant Challenge as H2O
Contaminant Challenge as H2O

Pall AresKleen Purification Material: Inert Gas Service
Maxi Gaskleen Purifier Assembly, Part # GLP8INPVMM4

Inlet Pressure: 0.21 MPa / 30 psig Contaminant Challenge as O2
Contaminant Challenge as O2
Type
Purifiers
Use
Gas Filtration, Purification
Ordering Information
Part Number Specific Gas Effluent Purity
Specifications
GLP8INPVMM4 Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, CO2, O2, CO
GLP8SIPVMM4 Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether 1 ppb H2O, CO2, O2, CO
  Carbon monoxide < 1 ppb H2O, O2, CO2, Ni(CO)4, FE(CO)5
GLP8FCPVMM4 Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2
GLP8GEH4PVMM4 Germane < 1 ppb H2O, CO2, O2, CO
GLP8SF6PVMM4 Sulfur hexafluoride < 1 ppb H2O, CO2, O2, CO
GLP8OXPVMM4 Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide < 10 ppb H2O
GLP8CLXPVMM4 Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O
GLP8HCLPVMM4 Hydrogen chloride < 15 ppb H2O
GLP8HBRPVMM4 Hydrogen bromide < 50 ppb H2O
GLP8CDAPVMM4 Photolithography clean dry air < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO)

Unit conversion: 100 kilopascals = 1 bar
Application
Process gas purification, ガス ろ過 & 精製