Mini Gaskleen® Gas Purifier product photo Primary L

Mini Gaskleen® Gas Purifier

Pall's Mini Gaskleen gas purifier is a true point-of use purifier. A unique combination of Pall's cutting-edge AresKleen™ purification material and Ultramet-L® stainless steel filter media, it is designed to remove contamination from many process gases. The purifier is capable of sub ppb level purification at designed flow rates of up to 1 splm, while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • One-for-one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Purifies a wide variety of gases
  • 100% helium leak and pressure tested
  • Compact size
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692


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Description
Pall's Mini Gaskleen gas purifier is a true point-of use purifier. A unique combination of Pall's cutting-edge AresKleen™ purification material and Ultramet-L® stainless steel filter media, it is designed to remove contamination from many process gases. The purifier is capable of sub ppb level purification at designed flow rates of up to 1 splm, while providing 3 nm filtration.
  • Controls and reduces impurities such as O2, H2O, CO2, CO, NMHC, Ni(CO)4 and Fe(CO)5
  • One-for-one dimensional replacement of conventional in-line particle filter assemblies
  • Assembly hardware is made of 316L stainless steel
  • High efficiency diffusion barrier ensures integrity of reactive material during installation
  • Superior pressure drop characteristics
  • Purifies a wide variety of gases
  • 100% helium leak and pressure tested
  • Compact size
  • Not orientation sensitive
  • Does not generate hazardous waste when used in non-hazardous gas service
  • Will not release hydrocarbons
  • No detectable metal contribution above background in HCl gas with HCLP material
  • No detectable metal contribution above background in HBr gas with HBRP material
Products in this datasheet may be covered by one or more patents, including US 7,465,692
Specifications

Materials

  • Electropolished 316 L VAR PLUS stainless steel components
  • ≤ 0.25 μm / 10 μin Ra internal surface finish

Particle Removal Efficiency Rating

  • 1x109 retention of particles ≥ 3 nm up to 2 slpm

Connections

  • 14 in. Gasket seal, male / male (VCR1 compatible)

Operating Conditions

  • Maximum operating pressure: 20.7 MPa / 3,000 psig
  • Maximum operating temperature:
    • 100 °C / 212 °F (INP, SIP, FCP, SF6P)
    • 40 °C / 104 °F (GEH4P, OXP, CLXP, HCLP, HBRP, CDAP)
  • EU pressure equipment directive: Assemblies have been evaluated and designed using SEP per the European Union's Pressure Equipment Directive 2014/68/EU and are not CE marked

Design Flow Rate

  • 0-1 slpm @ 0.1 MPa / 15 psig
  • Higher intermittent flow rates of up to 2 slpm can be accommodated, with reduced lifetime2

Packaging

  • Double bagged
  • Outer bag: aluminized Mylar3
  • Inner bag: polyethylene
  • End fittings capped with metal seals
  • Product packaged in an argon environment

Dimensions

  • Length: 84 mm / 3.31 in.
  • Diameter: 21.3 mm / 0.84 in.
1 VCR is a trademark of Swagelok Company
2 Contact the Pall Microelectronics Group for further information.
3 Mylar is a registered trademark of Dupont Teijin Films.


Technical Information

Impurity Removal as Tested in Specific Gases
Specific Gas Impurity Removal Efficiency
Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, CO2, O2 and CO, as tested in argon and nitrogen using APIMS analyzer
Flammable gases: Silane, hydrogen, methane, ethane,
cyclopropane, propane, dimethyl ether
< 1 ppb H2O, CO2, O2 and CO, as tested in argon, nitrogen and hydrogen using APIMS analyzer

< 1 ppb H2O, as tested in carbon monoxide using trace moisture analyzer

H2O and siloxanes removed to trace levels, as tested in silane using APIMS
Carbon monoxide < 1 ppb Ni(CO)4, and < 1 ppb Fe(CO)5, as tested in carbon monoxide using GC-ECD analyzer
Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer

< 1 ppb O2, as tested in trifluoromethane using trace oxygen analyzer

< 10 ppb H2O, as tested in trifluoromethane using trace moisture analyzer and FTIR
Germane < 1 ppb H2O, CO2, O2, and CO, as tested in argon and nitrogen using APIMS analyzer
Sulfur hexafluoride < 1 ppb H2O, CO2, and O2, as tested in argon using APIMS
Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide, clean dry air < 10 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O

< 1 ppb H2O, and CO2, as tested in argon using APIMS analyzer
Hydrogen chloride < 15 ppb H2O as tested in hydrogen chloride using CRDS

< 1 ppb H2O as tested in argon using APIMS analyzer
Hydrogen bromide < 50 ppb H2O as tested in hydrogen bromide using CRDS
< 1 ppb H2O as tested in argon using APIMS analyzer
Photolithography clean dry air < 1 ppb H2O as tested in argon using APIMS analyzer
< 300 ppt C4H8 as tested in argon using APIMS Analyzer
< 10 ppt SO2 as tested in nitrogen using ion chromatograph
< 15 ppt NH3 as tested in nitrogen using ion chromatograph
< 1 ppt HMDSO as tested in argon using APIMS analyzer and baseline subtraction
Performance

Pressure Drop vs. Gas Flow Rate

GLPINPVMM4

Lifetime Calculations

Pall AresKleen purification material: Inert gas service
Mini Gaskleen purifier assembly, part # GLPINPVMM4

Inlet pressure: 207 kPa (30 psig) contaminant challenge as H2O
contaminant challenge as H2O

Pall AresKleen purification material: Inert gas service
Mini-Gaskleen purifier assembly, part # GLPINPVMM4

Inlet pressure: 207 kPa (30 psig) contaminant challenge as O2
contaminant challenge as O2
Type
Purifiers
Use
Gas Filtration, Purification
Additional Information

Nominal Dimensions

Dimensions
Ordering Information
Part Number Specific Gas Effluent Purity Specifications
GLPINPVMM4 Inert gases: Nitrogen, argon, helium, xenon, krypton, neon < 1 ppb H2O, O2, CO2, CO
GLPSIPVMM4 Flammable gases: Silane, hydrogen, methane, ethane, cyclopropane, propane, dimethyl ether < 1 ppb H2O, CO2, O2, CO
  Carbon monoxide < 1 ppb H2O, O2, CO2, Ni(CO)4, Fe(CO)5
GLPFCPVMM4 Fluoromethane, difluoromethane, trifluoromethane, tetrafluoroethane, pentafluoroethane, heptafluoropropane, carbon tetrafluoride, perfluoropropane, perfluorocyclobutane, hexafluoroethane < 1 ppb H2O, CO2, O2
GLPGEH4PVMM4 Germane < 1 ppb H2O, CO2, O2, CO
GLPSF6PVMM4 Sulfur hexafluoride < 1 ppb H2O, CO2, O2, CO
GLPOXPVMM4 Oxygenated gases: Carbon dioxide, oxygen, nitrous oxide < 10 ppb H2O
GLPCLXPVMM4 Chlorinated gases: Boron trichloride, chlorine, trichlorosilane, dichlorosilane < 100 ppb H2O
GLPHCLPVMM4 Hydrogen chloride < 15 ppb H2O
GLPHBRPVMM4 Hydrogen bromide < 50 ppb H2O
GLPCDAPVMM4 Photolithography clean dry air < 1 ppb H2O, < 300 ppt organics (as C4), < 10 ppt acid gases (as SO2), < 15 ppt basic gases (as NH3), < 1 ppt refractory compounds (as HMDSO)

Unit conversion: 1 bar = 100 kilopascals
Application
Process gas purification