Datasheets
Download:The IonKleenTM G2 AQ Purifier has been specifically designed for the removal of metal ions from ultrapure water at high flow process conditions. It is ideally suited for use in the semiconductor industry’s most critical final cleaning processes. Utilizing Pall’s IonKleen G2 AQ membrane, the surface has been modified to incorporate ion exchange groups on its surface resulting in spontaneous and immediate metal removal from ultrapure water.
Features & Benefits
- High metal removal efficiency
- Simplifies purification techniques
- High capacity
- High flow
- Shipped dry
- Manufactured in a cleanroom environment
Materials of Construction
| Components | Materials |
| Filter Medium | Hydrophilic ultra high molecular weight polyethylene (UHMWPE) |
| Core, cage, end caps, support and drainage | High density polyethylene (HDPE) |
| O-rings | FEP Encapsulated Fluoroelastomer |
| Filter type | ABDG1 |
| Purifier Media Area | 1.3 m2 / 14 ft2 |
| Ion Exchange Capacity | > 68 meq |
| Maximum Operation Temperature | 70 °C / 158 °F |
| Maximum Operation Flow | < 45 L/min |
| Maximum Forward Differential Pressure | 0.1 MPa @ 70 °C / 14.5 psid @ 158 °F |
Dimensions
The IonKleen G2 AQ Purifier is recommended for point-of- use rinse water purification. It has also shown positive results in the purification of ultrapure water with pH > 4.
Pressure Drop vs. Liquid Flow Rate (Water, 20°C)1
1For liquids with viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.
Housings, Vessels, or Assemblies
Part Numbers / Ordering Information
ABDG1UPW3EH1
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