Posidyne® UP Filter product photo Primary L

Posidyne® UP Filter

The Posidyne UP filter is well suited for ultrapure water application for today's advanced semiconductor manufacturers. These filter cartridges utilize the crescentshaped Ultipleat® filter design, the latest advancement in filter technology, along with the benefit of a positive zeta potential.
  • Excellent particle removal efficiency
  • Positive zeta potential charge over a wide pH range
  • Two removal ratings available
  • Integrity testable
  • Many configurations available
  • High flow rates
  • Low extractables
  • Quick rinse-up
  • Manufactured in a cleanroom environment
  • 100% integrity tested


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Description
The Posidyne UP filter is well suited for ultrapure water application for today's advanced semiconductor manufacturers. These filter cartridges utilize the crescentshaped Ultipleat® filter design, the latest advancement in filter technology, along with the benefit of a positive zeta potential.
  • Excellent particle removal efficiency
  • Positive zeta potential charge over a wide pH range
  • Two removal ratings available
  • Integrity testable
  • Many configurations available
  • High flow rates
  • Low extractables
  • Quick rinse-up
  • Manufactured in a cleanroom environment
  • 100% integrity tested
Specifications

Materials

  • Medium: Nylon 6,6 positively charged
  • Core and cage: Polypropylene
  • End caps: Polyester
  • Support and drainage: Polyester
  • O-ring options: Silicone

Removal Ratings

  • 0.1 μm, 0.04 μm

Filter Areas

  • 1.4 m2 / 15 ft2 per 254 mm / 10 in. segment

Configurations

  • Nominal length:
    • 254 mm / 10 in.
    • 508 mm / 20 in.
    • 762 mm / 30 in.
    • 1016 mm / 40 in.
  • Diameter: 70 mm / 2.75 in.
  • O-ring size/end caps:
    • Code 3 (222 double O-ring / flat end)
    • Code 8 (222 double O-ring / finned end)
    • Code 7 (226 double O-ring / bayonet lock / finned end)

Performance Characteristics

  • Resistivity rinse-up to 18 megohm-cm: < 35 minutes
  • Single digit ppb TOC rinse-up: < 35 minutes

Operating Characteristics

  • Maximum Operating Temperature: 50 °C / 120 °F
  • Maximum Differential Pressure: 0.41 MPa @ 50 °C / 60 psid @ 120 °F

Integrity Test Values1

Per 254 mm / 10 in segment
  • 0.04 μm < 18.8 cm3/min @ 0.28 MPa / 40 psig
  • 0.1 μm < 50 cm3/min @ 0.35 MPa / 50 psig
1 Test fluid used is 100% H2O.
Performance

Pressure Drop vs. Liquid Flow Rate

Cartridge Style AB1

Cartridge Style AB1
Type
Cartridges and Elements
Use
Filtration, Purification
Ordering Information
Part
Number
Removal
Rating (μm)
Nominal
Length (mm / in)
Configuration
Code
O-Ring
Material2
AB1UNIZ8EH4 0.1 254 / 10 8 Silicone
AB1UNIZ7EH4 0.1 254 / 10 7 Silicone
AB1UNIZ3EH4 0.1 254 / 10 3 Silicone
AB2UNIZ8EH4 0.1 508 / 20 8 Silicone
AB2UNIZ7EH4 0.1 508 / 20 7 Silicone
AB2UNIZ3EH4 0.1 508 / 20 3 Silicone
AB3UNIZ8EH4 0.1 762 / 30 8 Silicone
AB3UNIZ7EH4 0.1 762 / 30 7 Silicone
AB3UNIZ3EH4 0.1 762 / 30 3 Silicone
AB4UNIZ8EH4 0.1 1016 / 40 8 Silicone
AB4UNIZ7EH4 0.1 1016 / 40 7 Silicone
AB4UNIZ3EH4 0.1 1016 / 40 3 Silicone
AB1UNDZ8EH4 0.04 254 / 10 8 Silicone
AB1UNDZ7EH4 0.04 254 / 10 7 Silicone
AB1UNDZ3EH4 0.04 254 / 10 3 Silicone
AB2UNDZ8EH4 0.04 508 / 20 8 Silicone
AB2UNDZ7EH4 0.04 508 / 20 7 Silicone
AB2UNDZ3EH4 0.04 508 / 20 3 Silicone
AB3UNDZ8EH4 0.04 762 / 30 8 Silicone
AB3UNDZ7EH4 0.04 762 / 30 7 Silicone
AB3UNDZ3EH4 0.04 762 / 30 3 Silicone
AB4UNDZ8EH4 0.04 1016 / 40 8 Silicone
AB4UNDZ7EH4 0.04 1016 / 40 7 Silicone
AB4UNDZ3EH4 0.04 1016 / 40 3 Silicone
2 Other O-ring materials are available, such as ultrapure clear silicone (H26 instead of H4)


Unit conversion: 1 bar = 100 kilopascals
Application
Wet etch & cleans, Ultrapure water, Cleaning
Segment
Display
Photovoltaics
Semiconductor