Ultipleat® G2 SP DR Filters and Ultipleat® G2 SP DR KC Assemblies product photo Primary L

Ultipleat® G2 SP DR Filters and Ultipleat® G2 SP DR KC Assemblies

The Pall Ultipleat G2 SP DR filter is designed specifically for high flow and improved particle removal in critical surface preparation chemical baths such as HF and BOE. The SP DR filter features a highly asymmetrical membrane construction, developed using Pall’s proprietary membrane modeling technology (MMT) .

The pore size distribution of the membrane uniformly transitions from microporous to nanoporous throughout its depth. The result is a new, application-specific membrane morphology designed for deep submicron retention of particles down to 2 nanometers. This retention is achieved without the flow restriction limitations of conventional membrane pore structures.

The 2 nanometer, 5 nanometer and 10 nanometer Ultipleat G2 SP DR filter uses native polyarylsulfone with over 40% higher surface energy than typical surface modified non-dewet PTFE membranes.

The Ultipleat G2 SP DR KC assemblies are completely disposable filter units. They are ideally suited for the filtration of etchant, low temperature stripping chemicals, and DI water.

  • MMT-enhanced dual retention of particles
  • Superior HF filtration
  • Higher flow rates and longer life
  • Hyperfine microporous membrane matrix
  • High surface energy membrane for minimized microbubble formation
  • Faster tool qualification for reduced cost of ownership
  • Prevent process contamination by using KC disposable assemblies


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Description

The Pall Ultipleat G2 SP DR filter is designed specifically for high flow and improved particle removal in critical surface preparation chemical baths such as HF and BOE. The SP DR filter features a highly asymmetrical membrane construction, developed using Pall’s proprietary membrane modeling technology (MMT) .

The pore size distribution of the membrane uniformly transitions from microporous to nanoporous throughout its depth. The result is a new, application-specific membrane morphology designed for deep submicron retention of particles down to 2 nanometers. This retention is achieved without the flow restriction limitations of conventional membrane pore structures.

The 2 nanometer, 5 nanometer and 10 nanometer Ultipleat G2 SP DR filter uses native polyarylsulfone with over 40% higher surface energy than typical surface modified non-dewet PTFE membranes.

The Ultipleat G2 SP DR KC assemblies are completely disposable filter units. They are ideally suited for the filtration of etchant, low temperature stripping chemicals, and DI water.

  • MMT-enhanced dual retention of particles
  • Superior HF filtration
  • Higher flow rates and longer life
  • Hyperfine microporous membrane matrix
  • High surface energy membrane for minimized microbubble formation
  • Faster tool qualification for reduced cost of ownership
  • Prevent process contamination by using KC disposable assemblies
Specifications

Materials of Construction

 
Components Materials
Filter Medium Polyarylsulfone
Support and drainage Polyethylene
Core,cage and end caps Polyethylene
Sealing method Melt seal
Housing PFA
O-ring options FEP encapsulated fluoroelastomer
 
* All fluoro-polymer materials made without PFOA


 
Product Name Ultipleat G2 SP DR KC Assemblies Ultipleat G2 SP DR Filters
Removal Ratings 30 nm 10 nm 5 nm 2 nm 30 nm 10 nm 5 nm 2 nm
Media Wettability Hydrophilic Hydrophobic Hydrophilic Hydrophobic
Filter Areas 1.9 m2 / 20.6 ft2 1.4 m2 / 15.0 ft2 1.9 m2 / 20.6 ft2 1.4 m2 / 15.0 ft2
Maximum Operating Temperature 70 °C / 158 °F
Maximum Operating Pressure 0.49 MPaG / 71 psig ‹ 25 °C / 77 °F
0.34 MPaG / 49 psig ‹ 70 °C / 158 °F
Maximum Forward Differential Pressure 0.1 MPa / 15 psid @ 70 °C / 158 °F
 

Dimensions (nominal)


Performance

Pressure Drop vs. Liquid flow Rate1 (Water, 20°C)




1Typical flow rates. For liquids with a viscosity differing from water, multiply the pressure drop by the viscosity in centipoise.
Type
Assemblies, Capsules, Cartridges and Elements
Ordering Information

Part Numbers / Ordering Information4

Ultipleat G2 SP DR KC Assemblies

LDF [1] 1[2] [3] E [4] [5]


Table 1

 
Code Flow
DT T-flow
DL L-flow
GN Inline
 

Table 2

 
Code Removal Ratings
HSAH 2 nm
HSSH 5 nm
HSVH 10 nm
HSQ 30 nm
 

Table 3

 
Code Inlet/Outlet Vent/Drain Memo
Head end Bowl end
128 ¾ in male ½ in male ½ in male T-flow / L-flow
164 1 in male ¼ in male ¼ in male Inline
168 1 in male ½ in male ½ in male T-flow
 

Table 4

 
Code Connections
2 Super Pillar Type (Nippon Pillar)2
51 Flare style
71 Super Pillar 300 P series (Nippon Pillar)
 

Table 5

 
Code Prewet Option Scope
None Dry 30 nm only
-K6 Dry, Low metal extractables3 30 nm only
-K13C Prewet filter (packaged in DI water), Low metal extractables3 5 nm, 10 nm
-K13D Prewet filter (packaged in DI water), Low metal extractables3 2 nm
 


Ultipleat G2 SP DR Filters

ABDG [1] [2] 3EH1 [3]

Table 1

 
Code Length (Nominal)
Inch mm
1 10 225
2 20 468
 

Table 2

 
Code Removal Ratings
HSAH 2 nm
HSSH 5 nm
HSVH 10 nm
HSQ 30 nm
 


Table 3

 
Code Prewet Option Scope
None Dry Available
-K3 Prewet filter (packaged in DI water) 5 nm, 10 nm
-K6 Dry, Low metal extractables3 30 nm
-K13C Prewet filter (packaged in DI water), Low metal extractables3 5 nm, 10 nm
-K13D Prewet filter (packaged in DI water), Low metal extractables3 2 nm
 


Application
Ultrapure water, Wet etch & cleans