UltiKleen™ G2 Excellar Filter and KC Assemblies product photo Primary L

UltiKleen™ G2 Excellar Filter and KC Assemblies

UltiKleen G2 Excellar Filter

The UltiKleen G2 Excellar filter is constructed of the most technologically advanced non-dewetting all-fluoro-polymer media that Pall offers for semiconductor applications. This filter is specifically designed to handle the aqueous-based, gas-generating chemicals vital for wafer cleaning (SC-1, SC-2 and SPM).

The non-dewetting property of the UltiKleen G2 Excellar filter is achieved using our proprietary Molecular Surface Tailoring (MST) technology for molecular-scale tailoring of the surface chemistry. Unlike conventional coating- and grafting-based methods, there is no potential for MST to compromise chemical compatibility or purity. With MST, the PTFE membrane remains robust and durable in highly corrosive acids, bases and organic compounds.

UltiKleen G2 Excellar KC Assemblies

UltiKleen G2 KC assemblies are completely disposable filter units that contain UltiKleen Excellar cartridges made of high-purity PFA. They are specifically designed and ideally suited for high-temperature process chemicals, particularly mixtures of sulfuric acid and hydrogen peroxide (SPM). The unique downstream venting-type assemblies allow bubbles to exhaust from chemicals efficiently and provide higher particle cleanliness levels.
  • Non-dewetting PTFE membrane
  • All-fluoro-polymer construction
  • Provided prewet with Full-Fill1 ultrapure water package
  • High temperature and pressure capabilities
  • Very high flow rates
  • Low extractables (<30 ppb2 in a 5% HCl extraction of 1.5 liters for 24 hours)
  • G2-type KC assembly available with downstream venting
  • Disposable filter unit with filter cartridge integrally sealed in housing
  • Sealed assembly for safer handling and faster changeout
  • 100% integrity tested


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Description

UltiKleen G2 Excellar Filter

The UltiKleen G2 Excellar filter is constructed of the most technologically advanced non-dewetting all-fluoro-polymer media that Pall offers for semiconductor applications. This filter is specifically designed to handle the aqueous-based, gas-generating chemicals vital for wafer cleaning (SC-1, SC-2 and SPM).

The non-dewetting property of the UltiKleen G2 Excellar filter is achieved using our proprietary Molecular Surface Tailoring (MST) technology for molecular-scale tailoring of the surface chemistry. Unlike conventional coating- and grafting-based methods, there is no potential for MST to compromise chemical compatibility or purity. With MST, the PTFE membrane remains robust and durable in highly corrosive acids, bases and organic compounds.

UltiKleen G2 Excellar KC Assemblies

UltiKleen G2 KC assemblies are completely disposable filter units that contain UltiKleen Excellar cartridges made of high-purity PFA. They are specifically designed and ideally suited for high-temperature process chemicals, particularly mixtures of sulfuric acid and hydrogen peroxide (SPM). The unique downstream venting-type assemblies allow bubbles to exhaust from chemicals efficiently and provide higher particle cleanliness levels.
  • Non-dewetting PTFE membrane
  • All-fluoro-polymer construction
  • Provided prewet with Full-Fill1 ultrapure water package
  • High temperature and pressure capabilities
  • Very high flow rates
  • Low extractables (<30 ppb2 in a 5% HCl extraction of 1.5 liters for 24 hours)
  • G2-type KC assembly available with downstream venting
  • Disposable filter unit with filter cartridge integrally sealed in housing
  • Sealed assembly for safer handling and faster changeout
  • 100% integrity tested
Specifications

Materials of Construction

 
Filter medium Surface-modified PTFE
Media support PTFE
Core, cage and end caps PFA
Sealing methods Melt seal
Housing PFA
O-ring options FEP-encapsulated fluoroelastomer, Kalrez3 and Chemraz4
 
3 Kalrez is a registered trademark of DuPont Performance Elastomers.
4 Chemraz is a registered trademark of Greene, Tweed & Co.

Removal Ratings and Operating Conditions

 
  UltiKleen G2 Excellar Filter UltiKleen G2 Excellar KC Assemblies
  ABFG1 ABFG2 ABFG3 T-flow, in-line, L-flow (10 in.)
Removal ratings 0.05 um
Filter area 2.2 m2 / 23.7 ft2 4.4 m2 / 47.4 ft2 6.6 m2 / 71.1 ft2 2.2 m2 / 23.7 ft2
Maximum operating temperature 170 ˚C / 338 ˚F
Maximum operating pressure 0.59 MPaG (85.6 psig) @ 50˚C (120˚F) 0.49 MPaG (71 psig) @ 25˚C (77˚F)
0.39 MPaG (56.6 psig) @ 60˚C (140˚F)
0.34 MPaG (49.3 psig) @ 90˚C (194˚F)
0.20 MPaG (29.0 psig) @ 120˚C (248˚F)
0.15 MPaG (21.8 psig) @ 150˚C (302˚F)
0.12 MPaG (17.4 psig) @ 170˚C (338˚F)
 

Dimensions

UltiKleen G2 Excellar Kleen Change Assemblies

In-Line L-Flow
In-Line L-Flow
T-Flow T-Flow
(Downstream venting type)
T-Flow T-Flow (Downstream venting type)

Dimensions by Configuration

G2 Excellar KC Assembly (LDFG / LDFV)

 
In-line Nominal Length (L) (mm / in.) T-Flow Nominal Length (L) (mm / in.) VT style Nominal Length (L) (mm / in.) L-flow Nominal Length (L) (mm / in.) VL style Nominal Length (L) (mm / in.)
12E2 396.5 / 15.6 12E2 408 / 16.1 12E2 377 / 14.8 12E2 408 / 16.1 12E2 440 / 17.35
12E51 412 / 16.2 12E71 403 / 15.9 128E2 385 / 15.2  
124E51 412 / 16.2 13E0 495 / 19.5 12E71 377 / 14.8  
16E8 428 / 16.9 13E1 432 / 17 12E72 377 / 14.8  
16E51 436 / 17.2 13E2 442 / 17.4 128E71 402 / 15.8  
17E0 448 / 17.6 13E6 416 / 16.4 128E72 402 / 15.8  
17E1 445 / 17.7 13E9 433 / 17.1 13E1 445 / 17.5  
17E51 442 / 17.4 13E51 473 / 18.6 13E51 444 / 17.4  
17E71 462 / 18.2 13E71 444 / 17.5 168E71 403 / 15.9  
        168E72 403 / 15.9  
 
Performance

Pressure Drop vs. Liquid Flow Rate5

UltiKleen G2 Excellar KC Assembly
(in-line, 1 in. nozzle)

UltiKleen G2 Excellar KC Assembly (in-line, 1 in. nozzle)

UltiKleen G2 KC Assembly
(L-flow and T-flow, 3/4 in. nozzle)

UltiKleen G2 KC Assembly (L-flow and T-flow, 3/4 in. nozzle)

UltiKleen G2 Excellar Filter (254 mm / 10 in.)

UltiKleen G2 Excellar Filter (254 mm / 10 in.)
5 For Liquids other than water, multiply the differential pressure by fluid viscosity in centipoise.

Unit conversion: 1 bar = 0.1 MPa
Type
Assemblies, Capsules, Cartridges and Elements
Ordering Information

UltiKleen G2 Excellar Filter

ABFG [1] GP [2] L3EH1 [3]

Table 1

 
Code Length (Nominal) mm / in
1 225 / 10
2 468 / 20
3 707 / 30
 

Table 2

 
Code Removal Ratings
D 0.05 μm
 

Table 3

 
Code Prewet Option
-K3 Prewet filter (packeged in DI water)
-K7 Prewet filter (packaged in DI water), low metal extractables6
 
6 Contact your local Pall representative for information about extractables.

UltiKleen G2 Excellar KC Assemblies7

LDF [1] [2] 1 GP [3] L [4] E[5] [6]

Table 1

 
Code Downstream Vent
G N/A
V Available
 

Table 2

 
Code Flow
T T-flow
N In-line
L L-flow
 

Table 3

 
Code Removal Ratings
D 0.05 um
 

Table 4

 
Code Inlet / Outlet Vent / Drain Type
Head End Bowl End
12 34 in. male 12 in. male 12 in. male T-flow / L-flow
12 34 in. male 12 in. male 12 in. female Downstream venting type
12 34 in. male 38 in. male 38 in. male In-line
124 34 in. male 14 in. male 14 in. male In-line
128 34 in. male 12 in. male 12 in. male Downstream venting type
13 34 in. male 12 in. female 12 in. female T-flow
16 1 in. male 12 in. male 12 in. male T-flow
16 1 in. male 12 in. male 12 in. female Downstream venting type
16 1 in. male 38 in. male 38 in. male In-line
164 1 in. male 14 in. male 14 in. male In-line
168 1 in. male 12 in. male 12 in. male Downstream venting type
17 1 in. female 12 in. female 12 in. female In-line
 

Table 5

 
Code Connections
0 NONE
1 20 series Flowell8
2 Super Pillar9 type
51 Flare style
6 FinalLock10
71 Super Pillar 300 P series
72 Super Pillar 300 P series L type
8 60 series Flowell
9 11CR series Flowell
 

Table 6

 
Code Prewet Option
-K3 Prewet filter (packeged in DI water)
-K7 Prewet filter (packeged in DI water)
low metal extractables5
 
7 Disposable capsules are not available with every option. (Refer to codes for options.) Contact your local Pall representative for option availability.
8 Flowell is a trademark of Flowell Corporation.
9 Super Pillar is a trademark of Nippon Pillar Packing Co., Ltd.
10 FinalLock is a trademark of Kurabo Industries Ltd.
Application
Wet etch & cleans, Chemicals, Wet etch & cleans