Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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ELEMENT 2-3/4", U010Z, 1 MICRON product photo

ELEMENT 2-3/4", U010Z, 1 MICRON

Product ID: CA41079D06
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 8" EPOCEL EG 25 MICRON product photo

ELEMENT 8" EPOCEL EG 25 MICRON

Product ID: CA41077D02
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 8" U0045Z 0.45 MICRON product photo

ELEMENT 8" U0045Z 0.45 MICRON

Product ID: CA41077D11
Unit of Measure
1/EA
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1
CA41083D11 product photo

CA41083D11

Product ID: CA41083D11
Unit of Measure
1/EA
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1
ELEMENT 12" EPOCEL EG 25 MICRON product photo

ELEMENT 12" EPOCEL EG 25 MICRON

Product ID: CA41083D02
Unit of Measure
1/EA
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1
ELEMENT 12" H1000 100 MICRON product photo

ELEMENT 12" H1000 100 MICRON

Product ID: CA41083D03
Unit of Measure
1/EA
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1

CRTG CFS94DEDDK

Product ID: CFS94DEDDK
Unit of Measure
1/EA
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1

CLR 3-30-M3E

Product ID: CLR330M3E
Unit of Measure
12/EA
Min Order Qty
12
ELEMENT 2 3/4" U010Z 1 MICRON product photo

ELEMENT 2 3/4" U010Z 1 MICRON

Product ID: CN05870C08
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

CX-23-19-6PD

Product ID: CX23196PD
Unit of Measure
1/EA
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1

ELEM,DISC,H , 7.00, 1.88,

Product ID: D116097921J53T
Unit of Measure
10/EA
Min Order Qty
10
MPDF 0.2-40VEE product photo

MPDF 0.2-40VEE

Product ID: MPDF0240VEE
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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