Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Brand

Duo-Fine®

Industries

Industrial Manufacturing

Gasket / O-Ring Material

FEP encapsulated fluorocarbon elastomer (O-rings)

Duo-Fine® , Filter Cartridges, Removal Rating 30 μm, Length 10 Inches, FEP encapsulated fluorocarbon elastomer Orings, Blank - DOE with elastomer gasket seals & end caps

Product ID: DFN3010AT
Unit of Measure
30/EA
Min Order Qty
30
Removal Rating
30 µm
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
FEP encapsulated fluorocarbon elastomer (O-rings)
End Configuration
Blank - DOE with elastomer gasket seals & end caps
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1 Item
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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