Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Brand

Epocel®

CRTG PCC060AF

Product ID: PCC060AF
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

PCC1001AF

Product ID: PCC1001AF
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 2 3/4" EPOCEL EC 5 MICRON product photo

ELEMENT 2 3/4" EPOCEL EC 5 MICRON

Product ID: CA41079D01
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 6" EPOCEL EC 5 MICRON product photo

ELEMENT 6" EPOCEL EC 5 MICRON

Product ID: CA41078D01
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 12" EPOCEL EC 5 MICRON product photo

ELEMENT 12" EPOCEL EC 5 MICRON

Product ID: CA41083D01
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 8" EPOCEL EG 25 MICRON product photo

ELEMENT 8" EPOCEL EG 25 MICRON

Product ID: CA41077D02
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 6" EPOCEL EG 25 MICRON product photo

ELEMENT 6" EPOCEL EG 25 MICRON

Product ID: CA41078D02
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 12" EPOCEL EG 25 MICRON product photo

ELEMENT 12" EPOCEL EG 25 MICRON

Product ID: CA41083D02
Unit of Measure
1/EA
Min Order Qty
1

MCC1401E100H

Product ID: MCC1401E100H
Unit of Measure
6/EA
Min Order Qty
6

MCC1401E100H1-316L

Product ID: MCC1401E100H1316L
Unit of Measure
6/EA
Min Order Qty
6

MCC1401E500H

Product ID: MCC1401E500H
Unit of Measure
6/EA
Min Order Qty
6

MCC1401E280H

Product ID: MCC1401E280H
Unit of Measure
6/EA
Min Order Qty
6

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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