Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Brand

HDC®

CTRG BW HDC HS-40 C7 40" product photo

CTRG BW HDC HS-40 C7 40

Product ID: BWAB4P1000XHS
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

CTRG BW HDC H050 C7 H 3H product photo

CTRG BW HDC H050 C7 H 3H

Product ID: BWAB3P050XHS
Unit of Measure
1/EA
Min Order Qty
1

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CTRG BW HDC H400 C7 (4-HIGH) product photo

CTRG BW HDC H400 C7 (4-HIGH)

Product ID: BWAB4P400XHS
Unit of Measure
1/EA
Min Order Qty
1

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FILTER product photo

FILTER

Product ID: HA73Y0061H
Unit of Measure
1/EA
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1

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AB05J0452H4 product photo

AB05J0452H4

Product ID: AB05J0452H4
Unit of Measure
1/EA
Min Order Qty
1
Filter 10" HDC II 0.6µm product photo

Filter 10" HDC II 0.6µm

Product ID: AB1J0067H1
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

AB1J012-8H4

Product ID: AB1J0128H4
Unit of Measure
6/EA
Min Order Qty
6

Filter 10" HDC II 2.5µm

Product ID: AB1J0253PH4
Unit of Measure
1/EA
Min Order Qty
1

AB1J012-8H1

Product ID: AB1J0128H1
Unit of Measure
6/EA
Min Order Qty
6

CRTG AB1J0253PH1

Product ID: AB1J0253PH1
Unit of Measure
1/EA
Min Order Qty
1

AB1J025-7PH1

Product ID: AB1J0257PH1
Unit of Measure
1/EA
Min Order Qty
1

AB1J025-8H1

Product ID: AB1J0258H1
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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