Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Brand

Ultipor®

ELEMENT 16" U0045Z 0.45 MICRON product photo

ELEMENT 16" U0045Z 0.45 MICRON

Product ID: CA41074D11
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 16" U200Z 25 MICRON product photo

ELEMENT 16" U200Z 25 MICRON

Product ID: CA41074D02
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 8" U0045Z 0.45 MICRON product photo

ELEMENT 8" U0045Z 0.45 MICRON

Product ID: CA41077D11
Unit of Measure
1/EA
Min Order Qty
1
CA41077D04 product photo

CA41077D04

Product ID: CA41077D04
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 2-3/4", U010Z, 1 MICRON product photo

ELEMENT 2-3/4", U010Z, 1 MICRON

Product ID: CA41079D06
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 8" U6-40Z 5 MICRON product photo

ELEMENT 8" U6-40Z 5 MICRON

Product ID: CA41077D08
Unit of Measure
1/EA
Min Order Qty
1
CA41083D11 product photo

CA41083D11

Product ID: CA41083D11
Unit of Measure
1/EA
Min Order Qty
1
ELEMENT 12" H1000 100 MICRON product photo

ELEMENT 12" H1000 100 MICRON

Product ID: CA41083D03
Unit of Measure
1/EA
Min Order Qty
1

MCS1001U010ZH

Product ID: MCS1001U010ZH
Unit of Measure
12/EA
Min Order Qty
12

MCS1001U030ZH2

Product ID: MCS1001U030ZH2
Unit of Measure
12/EA
Min Order Qty
12

MCS1001U200ZH

Product ID: MCS1001U200ZH
Unit of Measure
12/EA
Min Order Qty
12

MCS1001U220ZH

Product ID: MCS1001U220ZH
Unit of Measure
12/EA
Min Order Qty
12
175 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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