Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Industrial Manufacturing

Availability

In Stock

Product Type

Filter Cartridges

Nexis® T Filter Cartridges, Removal Rating 150 μm, Polypropylene, Length 20 inches, EPDM, SOE flat closed end external 222 O-rings product photo

Nexis® T Filter Cartridges, Removal Rating 150 μm, Polypropylene, Length 20 inches, EPDM, SOE flat closed end external 222 O-rings

Product ID: NXT15020UM3E
Unit of Measure
1/EA
Min Order Qty
1
Micron
150 micron

Nexis® T Filter Cartridges, Removal Rating 25 μm, Polypropylene, Length 20 inches

Product ID: NXT2520U
Unit of Measure
20/EA
Min Order Qty
20
Removal Rating
25 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
20 in
Cartridge Length (Metric)
508 mm
Cartridge Length (Metric)
50.8 cm
Gasket / O-Ring Material
NA
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Nexis® T Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 10 inches, DOE Santoprene gasket seal product photo

Nexis® T Filter Cartridges, Removal Rating 30 μm, Polypropylene, Length 10 inches, DOE Santoprene gasket seal

Product ID: NXT3010UH21
Unit of Measure
1/EA
Min Order Qty
1
Micron
30 micron

Nexis® T Filter Cartridges, Removal Rating 50 μm, Polypropylene, Length 30 inches, silicone, SOE fin end external 226 O-rings

Product ID: NXT5030UM7S
Unit of Measure
12/EA
Min Order Qty
12
Removal Rating
50 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
30 in
Cartridge Length (Metric)
762 mm
Cartridge Length (Metric)
76.2 cm
Gasket / O-Ring Material
Silicone
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Nexis® T Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal product photo

Nexis® T Filter Cartridges, Removal Rating 5 μm, Polypropylene, Length 30 inches, DOE Santoprene gasket seal

Product ID: NXT530UH21
Unit of Measure
10/EA
Min Order Qty
10
Micron
5 micron
Nexis® T Filter Cartridges, Removal Rating 75 μm, Polypropylene, Length 10 inches product photo

Nexis® T Filter Cartridges, Removal Rating 75 μm, Polypropylene, Length 10 inches

Product ID: NXT7510U
Unit of Measure
1/EA
Min Order Qty
1
Micron
75 micron

PMM,M020,316L 11.75X48

Product ID: P2015264
Unit of Measure
1/IN2
Min Order Qty
1

PMM,M020,316L 16X60

Product ID: P2019142
Unit of Measure
1/IN2
Min Order Qty
1

MC3000-187M

Product ID: P2021609
Unit of Measure
1/EA
Min Order Qty
1

PF 0.8-30AE

Product ID: PF0830AE
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

PF 2-30AE

Product ID: PF230AE
Unit of Measure
1/EA
Min Order Qty
1
Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 4 Inches, Fluorocarbon Elastomer product photo

Poly-Fine® II, Filter Cartridges, Removal Rating 0.2 μm, Highly Asymetric Polysulfone, Length 4 Inches, Fluorocarbon Elastomer

Product ID: PFT024UV
Unit of Measure
1/EA
Min Order Qty
1
Micron
0.2 µm
440 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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