Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Industrial Manufacturing

Filter Removal Rating

65 µm

Ultipor III Wire Mesh 65 micron Fluorocarbon 13in 33.02cm

Product ID: HC9600EOR13Z
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
65 µm
Nominal Length (Imperial)
13 in
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Ultipor III Wire Mesh 65 micron Nitrile 16in 40.64cm length

Product ID: HC9600EOR16H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
65 µm
Nominal Length (Imperial)
16 in
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HCY-8300EOR39HYK

Product ID: HCY8300EOR39HYK
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HCY830
Family
Red1000
Filter Media
Wire Mesh
Filter Removal Rating (μm)
65 µm
Nominal Length (Imperial)
39 in
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Ultipor III Wire Mesh 65 micron Fluorocarbon 3in 7.62cm length

Product ID: HC0469EOR3Z
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
No
Element Series
HC0469
Family
Ultipor III
Filter Media
Wire Mesh
Filter Removal Rating (μm)
65 µm
Nominal Length (Imperial)
3 in
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HC2216EOM4H

Product ID: HC2216EOM4H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC2216
Family
Ultipor
Filter Media
Wire Mesh
Filter Removal Rating (μm)
65 µm
Nominal Length (Imperial)
4 in
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5 Items
  • 1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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