Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Industrial Manufacturing

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Product Sub Type

Pleated Filters

Product Type

Filter Cartridges

Product Use

Air, Gas, and Vent Filtration

AB1RK7J

Product ID: AB1RK7J
Unit of Measure
1/EA
Min Order Qty
1

AB1RZ8H4

Product ID: AB1RZ8H4
Unit of Measure
1/EA
Min Order Qty
1

AB2M1002H1

Product ID: AB2M1002H1
Unit of Measure
1/EA
Min Order Qty
1

AB2RJ8J

Product ID: AB2RJ8J
Unit of Measure
1/EA
Min Order Qty
1

AB3PH7H1

Product ID: AB3PH7H1
Unit of Measure
1/EA
Min Order Qty
1

0.2UM Flourodyne II Membrane

Product ID: 20SXXM
Unit of Measure
1/FT
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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