Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Microelectronics

MICRO-FINE 10 product photo

MICRO-FINE 10

Product ID: MICROFINE10
Unit of Measure
30/EA
Min Order Qty
30

MPF2230F002EH1

Product ID: MPF2230F002EH1
Unit of Measure
1/EA
Min Order Qty
1

MPGH02120

Product ID: MPGH02120400
Unit of Measure
1/EA
Min Order Qty
1

NXA 10-10U-M3E

Product ID: NXA1010UM3E
Unit of Measure
48/EA
Min Order Qty
48

NXA 1-20U-M3E

Product ID: NXA120UM3E
Unit of Measure
1/EA
Min Order Qty
1

NXA 1-TFU-DOEE 47

Product ID: NXA1TFUDOEE47
Unit of Measure
1/EA
Min Order Qty
1

NXA 20-TFU-DOEE 47

Product ID: NXA20TFUDOEE47
Unit of Measure
1/EA
Min Order Qty
1

NXA 3-10U-M3E

Product ID: NXA310UM3E
Unit of Measure
30/EA
Min Order Qty
30

NXT 100-20U-M3E

Product ID: NXT10020UM3E
Unit of Measure
1/EA
Min Order Qty
1

Nexis® T Filter Cartridges, Removal Rating 10 μm, Polypropylene, Length 10 inches, DOE Santoprene gasket seal

Product ID: NXT1010UH21
Unit of Measure
1/EA
Min Order Qty
1
Removal Rating
10 µm
Membrane Material
Polypropylene
Cartridge Length (Imperial)
10 in
Cartridge Length (Metric)
254 mm
Cartridge Length (Metric)
25.4 cm
Gasket / O-Ring Material
NA
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NXT 10-29.25U-H21

Product ID: NXT102925UH21
Unit of Measure
1/EA
Min Order Qty
1

NXT 1-10U-M3E

Product ID: NXT110UM3E
Unit of Measure
30/EA
Min Order Qty
60

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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