Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Industries

Oil & Gas

RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
30/EA
Min Order Qty
30
Packaging
Bulk
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10RPN20

Product ID: 10RPN20
Unit of Measure
1/EA
Min Order Qty
1

Discontinued

This part is no longer available. Please contact us for more information.

OenoFlow FIT extensions modules US

Product ID: 20054148
Unit of Measure
1/EA
Min Order Qty
1

OenoFlow FIT Module T1

Product ID: 20054387
Unit of Measure
1/EA
Min Order Qty
1

Oenoflow FIT systems for US inventory

Product ID: 20054364
Unit of Measure
1/EA
Min Order Qty
1

AquaSep EL L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level, 24μm Beta 50 solids removal rating

Product ID: LCS06ELBH
Unit of Measure
4/EA
Min Order Qty
4
Maximum Operating Temperature (F)
140 °F
Maximum Operating Temperature (C)
60 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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LCMEH

Product ID: LCMEH
Unit of Measure
1/EA
Min Order Qty
1

AquaSep Plus L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level, 1μm Beta 200 solids removal rating

Product ID: LCS06B1AH
Unit of Measure
1/EA
Min Order Qty
1
Maximum Operating Temperature (F)
150 °F
Maximum Operating Temperature (C)
66 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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AquaSep XS L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level, 11μm Beta 5000 solids removal rating

Product ID: LCS06PXSH
Unit of Measure
1/EA
Min Order Qty
1
Maximum Operating Temperature (F)
140 °F
Maximum Operating Temperature (C)
60 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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PhaseSep L/L Coalescer, 20in length, 3.75in diameter, ≤15ppm separation level

Product ID: LCS2H1AH316
Unit of Measure
1/EA
Min Order Qty
1
Coalescer Length (Imperial)
20 in
Coalescer Length (Metric)
50.8 cm

PhaseSep L/L Coalescer, 6in length, 2.75in diameter, ≤15ppm separation level

Product ID: LCS06H1HH
Unit of Measure
1/EA
Min Order Qty
1
Maximum Operating Temperature (F)
300 °F
Maximum Operating Temperature (C)
149 °C
Change out pressure drop (bar)
1.03 bar
Change out pressure drop (psid)
15 psid
Maximum differential pressure rating (bar)
3.5 bar
Maximum differential pressure rating (psid)
50 psid
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PhaseSep AS L/L Coalescer - PPS Depth - 20" - Fine Removal Rating

Product ID: LCS2FPS100966
Unit of Measure
12/EA
Min Order Qty
12
Coalescer Length (Imperial)
20 in
Coalescer Length (Metric)
50.8 cm

This product is currently not available. Please contact us for more information.

880 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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