Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Power & Utilities

Product Type

Sheet Depth Filter Modules

SUPRAdisc SD 300 300X300C216PP product photo

SUPRAdisc SD 300 300X300C216PP

Product ID: B15123
Unit of Measure
1/EA
Min Order Qty
1
SUPRAdisc SDT 950 300T950C416VP product photo

SUPRAdisc SDT 950 300T950C416VP

Product ID: 7006071
Unit of Measure
1/EA
Min Order Qty
1
SUPRAdisc SD 900 300X900C516VP product photo

SUPRAdisc SD 900 300X900C516VP

Product ID: 7005974
Unit of Measure
1/EA
Min Order Qty
1
SUPRAdisc SDT 5500 300T550S216VP product photo

SUPRAdisc SDT 5500 300T550S216VP

Product ID: B15808
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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