Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Filter Cartridges

RT250A10S product photo

RT250A10S

Product ID: RT250A10S
Unit of Measure
1/EA
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1
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Bulk
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WCG150-30-U6-40ZJ-106-K10

Product ID: WCG15030U640S00001
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1/EA
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1

WCN150HFU618UY020JU

Product ID: WCN150HFU618S00001
Unit of Measure
4/EA
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4

WCG150-30-U001ZJ-106-K10

Product ID: WCG15030U001S00001
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1/EA
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1

WCG150-30-U6-40ZJ

Product ID: WCG15030U640ZJ
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1/EA
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1

WCG300-30-U6-40ZJ-K10

Product ID: WCG30030U640ZJK10
Unit of Measure
1/EA
Min Order Qty
1

WCN150HFU618J010JU

Product ID: WCN150HFU618J010JU
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1/EA
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1

WCN150-20-U2-20ZJ

Product ID: WCN15020U220ZJ
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1/EA
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1

WCG300-30-U010ZJ-K10

Product ID: WCG30030U010ZJK10
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1/EA
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1

WCN80-20U001ZJ-MOD-G

Product ID: WCN8020U001ZJMODG
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1/EA
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1

WCN80-20-U2-20ZJ

Product ID: WCN8020U220ZJ
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1/EA
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1

WCN35-20-ECJ

Product ID: WCN3520ECJ
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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