Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Product Type

Metal Filters

C14061S100 product photo

C-14-06-1S100

Product ID: C14061S100
Unit of Measure
1/EA
Min Order Qty
1
C-14-06-1S200 product photo

C-14-06-1S200

Product ID: C14061S200
Unit of Measure
1/EA
Min Order Qty
1
C-23-19-6PH product photo

C-23-19-6PH

Product ID: C23196PH
Unit of Measure
1/EA
Min Order Qty
1
PSS-M,D,1/16,2.116DIA product photo

PSS-M,D,1/16,2.116DIA

Product ID: PSSMD1162116DIA
Unit of Measure
1/EA
Min Order Qty
1
S120242FS100-14 product photo

S120242FS100-14

Product ID: S120242FS10014
Unit of Measure
1/EA
Min Order Qty
1
S60141H550-100-W product photo

S60141H550-100-W

Product ID: S60141H550100W
Unit of Measure
1/EA
Min Order Qty
1
S70171H550-100 product photo

S70171H550-100

Product ID: S70171H550100
Unit of Measure
1/EA
Min Order Qty
1
S70172FS100-075-3M-2 product photo

S70172FS100-075-3M-2

Product ID: S70172FS1000753M2
Unit of Measure
1/EA
Min Order Qty
1
2PSS,W.S.,316SST,GR H,1/8 T product photo

2PSS,W.S.,316SST,GR H,1/8 T

Product ID: P2500143
Unit of Measure
1/IN2
Min Order Qty
1
2PSS,W.S.,316SST,GR E,1/8 T product photo

2PSS,W.S.,316SST,GR E,1/8 T

Product ID: P2500167
Unit of Measure
1/IN2
Min Order Qty
1
2PSS,W.S.,316SST,GR D,1/8 T product photo

2PSS,W.S.,316SST,GR D,1/8 T

Product ID: P2500190
Unit of Measure
1/IN2
Min Order Qty
1
2PSS,W.S.,316SST,GR D,1/16 product photo

2PSS,W.S.,316SST,GR D,1/16

Product ID: P2500186
Unit of Measure
1/IN2
Min Order Qty
1
83 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

    Select Language :
    English