Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Metal Filters

C-14-06-1S200 product photo

C-14-06-1S200

Product ID: C14061S200
Unit of Measure
1/EA
Min Order Qty
1
C14061S100 product photo

C-14-06-1S100

Product ID: C14061S100
Unit of Measure
1/EA
Min Order Qty
1
C-23-19-6PH product photo

C-23-19-6PH

Product ID: C23196PH
Unit of Measure
1/EA
Min Order Qty
1
AB2RT7H4 product photo

AB2RT7H4

Product ID: AB2RT7H4
Unit of Measure
1/EA
Min Order Qty
1
B-12-18-F product photo

B-12-18-F

Product ID: B1218F
Unit of Measure
1/EA
Min Order Qty
1
PWC10-10-S-DOE ST product photo

PWC10-10-S-DOE ST

Product ID: DP1000HDOH010
Unit of Measure
1/EA
Min Order Qty
1
PSP09-10-S-DOE/8061135000 product photo

PSP09-10-S-DOE/8061135000

Product ID: DP1000HDOH09A
Unit of Measure
1/EA
Min Order Qty
1
PWC70-10-S-DOE/8101105000 ST product photo

PWC70-10-S-DOE/8101105000 ST

Product ID: DP1000HDOH070
Unit of Measure
1/EA
Min Order Qty
1
PSP04-10-S-DOE/8061055000 ST product photo

PSP04-10-S-DOE/8061055000 ST

Product ID: DP1000HDOH64S
Unit of Measure
1/EA
Min Order Qty
1
PWC250-10-S-DOE/8101210000 ST product photo

PWC250-10-S-DOE/8101210000 ST

Product ID: DP1000HDOH250
Unit of Measure
1/EA
Min Order Qty
1
PWC40-10-S-DOE/8101085000 product photo

PWC40-10-S-DOE/8101085000

Product ID: DP1000HDOH040
Unit of Measure
1/EA
Min Order Qty
1
PWC140-10-S-DOE/8101126000 product photo

PWC140-10-S-DOE/8101126000

Product ID: DP1000HDOH140
Unit of Measure
1/EA
Min Order Qty
1
80 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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