Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Product Type

Microza Hollow Fiber Modules

ACP-1053D product photo

ACP-1053D

Product ID: P2049949
Unit of Measure
1/EA
Min Order Qty
1
USP-143 product photo

USP-143

Product ID: P2215486
Unit of Measure
1/EA
Min Order Qty
1
TUBE GUIDE 316 4 HIGH product photo

TUBE GUIDE 316 4 HIGH

Product ID: T10574042
Unit of Measure
1/EA
Min Order Qty
1
TUBE GUIDE 316 3 HIGH product photo

TUBE GUIDE 316 3 HIGH

Product ID: T10574041
Unit of Measure
1/EA
Min Order Qty
1
TEE HANDLE C/N 1 HEAD product photo

TEE HANDLE C/N 1 HEAD

Product ID: T20010035
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

MODULE,MF,UNA-620A product photo

MODULE,MF,UNA-620A

Product ID: WH015807
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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