Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Other Finished Goods

HT0644GK100G product photo

HT0644GK100G

Product ID: HT0644GK100G
Unit of Measure
1/EA
Min Order Qty
1
R2FUY1000J8 product photo

R2FUY1000J8

Product ID: R2FUY1000J8
Unit of Measure
1/EA
Min Order Qty
1
FILTER ELEMENT product photo

FILTER ELEMENT

Product ID: RL61410A
Unit of Measure
6/EA
Min Order Qty
6
RL-511-10 product photo

RL-511-10

Product ID: RL51110
Unit of Measure
1/EA
Min Order Qty
1
CRTG SLK7001BC product photo

CRTG SLK7001BC

Product ID: SLK7001BC
Unit of Measure
1/EA
Min Order Qty
1
F STYLE S/S SLIDE FLANGE product photo

F STYLE S/S SLIDE FLANGE

Product ID: T20095035
Unit of Measure
5/EA
Min Order Qty
5
C030A10U product photo

C030A10U

Product ID: C030A10U
Unit of Measure
30/EA
Min Order Qty
30
C200AW20U product photo

C200AW20U

Product ID: C200AW20U
Unit of Measure
1/EA
Min Order Qty
1
MCS1001EEJ product photo

MCS1001EEJ

Product ID: MCS1001EEJ
Unit of Measure
6/EA
Min Order Qty
6
MICRO-FINE 10 product photo

MICRO-FINE 10

Product ID: MICROFINE10
Unit of Measure
30/EA
Min Order Qty
30
DISC NM NHG 047100 product photo

DISC NM NHG 047100

Product ID: NHG047100
Unit of Measure
1/EA
Min Order Qty
1
FILTER product photo

FILTER

Product ID: FNC10R30P
Unit of Measure
30/EA
Min Order Qty
30

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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