Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Product Type

Process Sheet Based Filter

SUPRAdisc SD II 300 200X300S232SP

Product ID: 7005291
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

7005882 product photo

SUPRAdisc SD 300 300X300C516SP

Product ID: 7005882
Unit of Measure
1/EA
Min Order Qty
1
7007251 product photo

SUPRAdisc SD II EK 200XEK0C440SP

Product ID: 7007251
Unit of Measure
1/STK
Min Order Qty
1

This product is currently not available. Please contact us for more information.

SUPRAdisc SD II 200 200X200C440SP

Product ID: 7007259
Unit of Measure
1/EA
Min Order Qty
1

SUPRAdisc SD II 700 200X700C440SP

Product ID: 7007263
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

7007323 product photo

SUPRAdisc SD II 300 200X300C440SP

Product ID: 7007323
Unit of Measure
1/EA
Min Order Qty
1
B17738 product photo

SUPRAdisc SD 50 300X050C216SP

Product ID: B17738
Unit of Measure
1/EA
Min Order Qty
1

This product is currently not available. Please contact us for more information.

7007261 product photo

SUPRAdisc SD II 250 200X250C440SP

Product ID: 7007261
Unit of Measure
1/EA
Min Order Qty
1

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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