Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Filter Removal Rating

40 µm

Family

Ultipor III

Product Use

Lube and Hydraulic Oil Filtration

ELEMENT 0961KR18H

Product ID: HC0961FKR18H
Unit of Measure
6/EA
Min Order Qty
6
Anti-Static
No
Element Series
HC0961
Family
Ultipor III
Filter Removal Rating (μm)
40 µm
Nominal Length (Imperial)
18 in
Nominal Length (Metric)
45.72 cm
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Ultipor III 40 micron Nitrile 16in 40.64cm (REPLACED BY HC9600FRR16Z)

Product ID: HC9600FKR16H
Unit of Measure
1/EA
Min Order Qty
1
Anti-Static
No
Element Series
HC9600
Family
Ultipor III
Filter Removal Rating (μm)
40 µm
Nominal Length (Imperial)
16 in
Nominal Length (Metric)
40.64 cm
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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