Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

Order Products

Industries

Microelectronics

Availability

In Stock

Product Type

Filter Cartridges

WFN 0.45-10US-M20 300

Product ID: WFN04510USM20300
Unit of Measure
1/EA
Min Order Qty
1
NXT 150-20U product photo

Nexis, NXT, 150 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT15020U
Unit of Measure
10/EA
Min Order Qty
10
Micron
150 micron

R4F100

Product ID: R4F100TIMONIUM
Unit of Measure
12/EA
Min Order Qty
12

PUY01ZU010ZJ

Product ID: PUY01ZU010ZJ
Unit of Measure
1/EA
Min Order Qty
1

R3F700

Product ID: R3F700TIMONIUM
Unit of Measure
48/EA
Min Order Qty
48

R3F030

Product ID: R3F030TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24

R3F200

Product ID: R3F200TIMONIUM
Unit of Measure
24/EA
Min Order Qty
24
Claris, Polypropylene, 50 micron, 29.25 inch product photo

Claris, Polypropylene, 50 micron, 29.25 inch

Product ID: CLR502925
Unit of Measure
12/EA
Min Order Qty
12
Length
74.3 cm / 29.25 in
Micron
50 micron

PUY2UY045J

Product ID: PUY2UY045J
Unit of Measure
1/EA
Min Order Qty
1

MPF2230F002EH1

Product ID: MPF2230F002EH1
Unit of Measure
1/EA
Min Order Qty
1
U020AW40U-EC1U product photo

U020AW40U-EC1U

Product ID: U020AW40UEC1U
Unit of Measure
1/EA
Min Order Qty
1
Packaging
Bulk
See All Attributes

AB2P10018J

Product ID: AB2P10018JTIMONIUM
Unit of Measure
1/EA
Min Order Qty
1
31 Items

Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

*Please refer to the documentation for additional specifications.

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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