Profile® II Depth Filters for CMP Applications

High-Efficiency Depth Filters for CMP Application Filtration

Profile II depth filter cartridges for chemical mechanical processing (CMP) applications effectively remove agglomerated particles and gels from oxide, tungsten and copper slurries without disturbing particle distribution. The steep efficiency curves in these filters result in minimal strip-out of desirable slurry particles while sharply increasing the removal of oversized particles.

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Microelectronics

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U003AW29.5A product photo

U003AW29.5A

Product ID: U003AW295A
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NXT 20-9.875U-H21

Product ID: NXT209875UH21
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NXT 100-20U-M3E

Product ID: NXT10020UM3E
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Nexis, NXT, 0.5 μm, 50.8 cm (20 in), DOE industrial (no end caps)

Product ID: NXT0520U
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Micron
0.5 micron
PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3 product photo

PolyFine-II Filter Cartridge, Highly asymmetric polysulfone, 0.2 µm, 10 in, EPDM, M3

Product ID: PFT0210UEM3BLK513
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Micron
0.2 µm
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T010A10Y

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20" Ultipor GF+ 1µm, DOE with EPR gaskets

Product ID: MCY1002U010ZJ
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This product is currently not available. Please contact us for more information.

NXT 1-10U-M3F product photo
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U0.5AW19.5U

Product ID: U05AW195U
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Profile Code 19 20

Product ID: AB2P01019J
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U050AW40A

Product ID: U050AW40A
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U001A9.75U-1PK

Product ID: U001A975U1PK
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Description

Why choose CMP depth filter cartridges?

These depth filters are available in removal ratings from 0.2 to 40 µm, which are five to 10 times finer than traditional depth filter ratings. They also include a continuously profiled pore structure for built-in prefiltration.

Applications

Microelectronics:

  • Chemical mechanical processing (CMP)

Specifications

 

Removal Ratings

 

  • 0.2 µm, 0.3 µm, 0.5 µm, 1 µm, 3 µm, 5 µm, 10 µm, 20 µm, 30 µm and 40 µm 

 

Pressure Drop vs. Liquid Flow Rate1

 

1 For liquids with viscosities differing from water, multiply the pressure drop by the viscosity in centipoise.

Documents

Data Sheets

  • Profile® II Filters for CMP Applications

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